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From: microscopytoday-at-tampabay.rr.com
Date: Wed, 1 Nov 2006 12:34:25 -0600
Subject: [Microscopy] Microscopy Today November 2006 Table of Contents

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Listers,

Here is the November 2006 Microscopy Today table of contents. I will
close the subscription list for this issue on Monday, Nov 6th, 2006.

Microscopists in North America and MSA members anywhere can subscribe
for free. Anyone else may subscribe for US$50 per year (to PARTIALLY
cover postage). All subscriptions at http://www.microscopy-today.com
Thank you.

Ron Anderson, Editor
================================
Microscopes in Art Galleries?
Stephen W. Carmichael, Mayo Clinic

Recent Advances in High-Speed Orientation Mapping
Matthew M. Nowell1, Martina Chui-Sabourin2, and John O. Carpenter1
1 EDAX-TSL, Draper, UT, 2 EDAX-TSL, Mahwah, NJ

Diffracted Light Contrast: Improving the Resolution of a Basic Light
Microscope by an Order of Magnitude
W. Barry Piekos, Yale University, New Haven, CT

Nature’s Engineering Marvels: the Structure and Chemistry of a Butterfly
Wing
V.S. Smentkowski, S.G. Ostrowski, E.J. Olson, J. Cournoyer,
K. Dovidenko, R.A. Potyrailo, General Electric Niskayuna, NY

Integrating High Resolution Light Microscopy and Real Time Observation
of Fluorescent Labels
Thomas A. Hasling, Aetos Technologies, Inc., Auburn, AL

Surface Rippling & Ion Etch Yields of Diamond Using a Focused Ion Beam:
With or Without Enhanced-Chemistry, Aspect Ratio Regulates Ion Etching
W. J. MoberlyChan, T. E. Felter, & M. A. Wall, Lawrence Livermore
National Lab., Livermore, CA

Internet-Based Administration of Shared Instruments with Facility Online
Manager
Shu-You Li and Vinayak P. Dravid, Northwestern University, Evanston, IL

Andrew Paul Leonard: Capturing the Cover of Time Magazine
Lise Millay Stevens, MA

Streamlining the Modern Lab
Radhika Subramanian, Cornet Technology, Inc., Springfield, VA

Intermediate Magnification Imaging System for Whole Organs/Organisms
Richard W. Cole, Carmen A. Mannella, Christian Renken, and James N.
Turner, Wadsworth Center, Albany, NY

The NEST Laboratory: The Art of a Multi-User Facility
Scott Streiker and Rachel Smith, University of Dayton, Dayton, OH

Butyl-methyl-methacrylate for Immunocytochemistry Through the Light
Microscope
Tobias I. Baskin, University of Massachusetts, Amherst, MA

How To Stick Loosely Adherent Cells To Glass Slides
Martin Spitaler, Imperial College, London, UK

Just Say NO to Microtoming Silicon!
Ron Anderson, Microscopy Today, Largo, FL

Industry News

Netnotes
SPECIMEN PREPARATION - ventricle embedding problem
SPECIMEN PREPARATION - sample preparation polymer blend
SPECIMEN PREPARATION - Staining starch in sections
SPECIMEN PREPARATION - staining methods
SPECIMEN PREPARATION - Thiocarbohydrazide
SPECIMEN PREPARATION - cotton fibers
IMMUNOCYTOCHEMISTRY - Immunogold labeling & SEM
IMMUNOCYTOCHEMISTRY – testing colloidal gold
IMAGE ANALYSIS – object size
EM - Venting EM Chambers
TEM – electron diffraction
TEM – Nickel grids & EDX
SEM – Back scattered electrons and edge effects
SEM – Backscattered electron images

Index of Advertisers


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From: r.sims-at-auckland.ac.nz
Date: Wed, 1 Nov 2006 13:22:49 -0600
Subject: [Microscopy] Carbon Coater questions

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html


Hi

I have a 1972 Edwards 306 coater, with the 'SEM Planetary
Workholder', which is used to carbon-coat samples for EPMA analysis.

It often works OK, and I monitor the coating thickness by watching the
color change of a polished brass surface which is in there with the
samples. Sometimes to get a satisfactory coating I have to go through
two or three cycles of: new carbon rod, evacuate, apply current to the
rod until it burns out, bring up to atmospheric pressure, allow the
rodholder to cool, which drives me a bit nuts, but it always gets there in
the end.

It will coat up to three 47 x 27mm slides or six 1" diameter plugs, or 3
of each, at the same time.

I have two questions:

1 On the very left-hand side of the circuit diagram, the auxiliary
contacts of 8-Amp circuit breaker CB2 supply mains power, through a
few interlock switches, to a rectangular box labelled 'ILC'. What is this
ILC thing? I have pored over the manual, searching for a clue, but have
found none. Does anyone know either what ILC is, where it is located,
or what current it draws? My problem is that CB2 has started to trip out
from time to time, I would like to replace CB2, but I have no idea of the
current rating needed for the auxiliary contacts. Also, what is the
rectangular box 'AAV' just to the left of the Pirani gauge?

2 I have a window of opportunity to replace the whole unit, but the
window will be open for only a short while, and I am not familiar with
the current market in vacuum coaters. I would greatly appreciate any
specific recommendations (directly to me, if you wish) for suitable
replacements. The window is not open very wide, either, so my budget
is limited to around US$35K.


thanks in anticipation


Ritchie Sims



--
Ritchie Sims Ph D Phone : 64 9
3737599 ext 87713
Microanalyst Fax : 64 9 3737435
Department of Geology email :
r.sims-at-auckland.ac.nz
The University of Auckland
Private Bag 92019
Auckland
New Zealand


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16, 26 -- From r.sims-at-auckland.ac.nz Wed Nov 1 13:22:49 2006
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From: bbandli-at-mvainc.com
Date: Wed, 1 Nov 2006 13:42:36 -0600
Subject: [Microscopy] Re: Carbon Coater questions

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

The problem is potentially due to the carbon rods rather than the
evaporator. Brown et al. 1991 (Carbon rod failure during carbon
coating, The Microscope, v. 39, pp265-267) describe how the
quality/composition of the carbon rod can significantly effect the
longevity of carbon rods during carbon evaporation.

Cheers,
Bryan Bandli


r.sims-at-auckland.ac.nz wrote:
} ----------------------------------------------------------------------------
} The Microscopy ListServer -- CoSponsor: The Microscopy Society of America
} To Subscribe/Unsubscribe -- http://www.microscopy.com/MicroscopyListserver
} On-Line Help http://www.microscopy.com/MicroscopyListserver/FAQ.html
} ----------------------------------------------------------------------------
}
}
} Hi
}
} I have a 1972 Edwards 306 coater, with the 'SEM Planetary
} Workholder', which is used to carbon-coat samples for EPMA analysis.
}
} It often works OK, and I monitor the coating thickness by watching the
} color change of a polished brass surface which is in there with the
} samples. Sometimes to get a satisfactory coating I have to go through
} two or three cycles of: new carbon rod, evacuate, apply current to the
} rod until it burns out, bring up to atmospheric pressure, allow the
} rodholder to cool, which drives me a bit nuts, but it always gets there in
} the end.
}
} It will coat up to three 47 x 27mm slides or six 1" diameter plugs, or 3
} of each, at the same time.
}
} I have two questions:
}
} 1 On the very left-hand side of the circuit diagram, the auxiliary
} contacts of 8-Amp circuit breaker CB2 supply mains power, through a
} few interlock switches, to a rectangular box labelled 'ILC'. What is this
} ILC thing? I have pored over the manual, searching for a clue, but have
} found none. Does anyone know either what ILC is, where it is located,
} or what current it draws? My problem is that CB2 has started to trip out
} from time to time, I would like to replace CB2, but I have no idea of the
} current rating needed for the auxiliary contacts. Also, what is the
} rectangular box 'AAV' just to the left of the Pirani gauge?
}
} 2 I have a window of opportunity to replace the whole unit, but the
} window will be open for only a short while, and I am not familiar with
} the current market in vacuum coaters. I would greatly appreciate any
} specific recommendations (directly to me, if you wish) for suitable
} replacements. The window is not open very wide, either, so my budget
} is limited to around US$35K.
}
}
} thanks in anticipation
}
}
} Ritchie Sims
}
}
}
} --
} Ritchie Sims Ph D Phone : 64 9
} 3737599 ext 87713
} Microanalyst Fax : 64 9 3737435
} Department of Geology email :
} r.sims-at-auckland.ac.nz
} The University of Auckland
} Private Bag 92019
} Auckland
} New Zealand
}
}
} ==============================Original Headers==============================
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}
}

--
-----------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------
Bryan Bandli
Research Microscopist
MVA Scientific Consultants
3300 Breckinridge Blvd., Suite 400
(770) 662-8509
-----------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------
The information in this email is confidential and may be legally privileged.
It is intended solely for the addressee. If you are not the intended recipient, please delete the email and notify MVA Scientific Consultants of the transmission error.
MVA Scientific Consultants - 3300 Breckinridge Blvd. Suite 400, Duluth, GA 30096 - (770)662-8509
-------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------




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From: cervantes-at-bendres.com
Date: Wed, 1 Nov 2006 21:33:46 -0600
Subject: [Microscopy] viaWWW: TEM- EDS on vitrified samples

Contents Retrieved from Microscopy Listserver Archives
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Email: cervantes-at-bendres.com
Name: Jessica Cervantes

Organization: Bend Research Inc

Title-Subject: [Filtered] TEM- EDS on vitrified samples

Question: I'm trying to determine whether EDS analysis can be performed successfuly on vitrified cryo TEM samples. I have asked around, and done a few brief literature searches for information on this topic, and haven't got any good answers.

If anyone has any experience in this area, I'd love to hear from you.

Thanks,
Jessica Cervantes


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From: dmcdaniel-at-usuhs.mil
Date: Thu, 2 Nov 2006 08:05:52 -0600
Subject: [Microscopy] viaWWW: LR White flat embedding

Contents Retrieved from Microscopy Listserver Archives
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Email: dmcdaniel-at-usuhs.mil
Name: Dennis McDaniel

Title-Subject: [Filtered] LR White flat embedding

Question: I have some fibroblasts which were grown on glass coverslips and fixed, dehydrated and infiltrated with LR White. I put a piece of aclar film over the top and polymerized the resin, but now I am having a very difficult time getting the LR White to separate from the coverslip so that I can glue it to an empty BEEM capsule. Does anyone know any good tricks? Thanks.

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From: krensing-at-ucalgary.ca
Date: Thu, 2 Nov 2006 10:52:48 -0600
Subject: [Microscopy] EM400 pole pieces

Contents Retrieved from Microscopy Listserver Archives
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I have a box here with EM400 analytical pole pieces for +/- 60 degree
tilt. At least that's what it says on the box. Is anyone interested in
having them?
Kim

--
Kim Rensing Ph.D.
Manager,
Microscopy and Imaging Facility

University of Calgary,
Health Sciences Centre
B129 - 3330 Hospital Drive NW
Calgary, AB, Canada T2N 4N1

403-220-3488
krensing-at-ucalgary.ca


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From: cervantes-at-bendres.com
Date: Thu, 2 Nov 2006 11:57:35 -0600
Subject: [Microscopy] viaWWW: TEM- EDS on vitrified samples

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

My samples are indeed particles, which are in an aqueous suspension. The suspensions are vitrified for cryo TEM imaging to observe particles in the pseudo-liquid state. The goal with EDS would be to get elemental mapping of the particles themselves. What I am concerned about is the degradation of the sample upon analysis with EDS, and if enough signal can be detected from particles that may be only 100 nm in diameter.

Our ultimate goal is to characterize differences between the surface of the particle and it's interior, in the solution state. To my limited knowledge, there is not a characterization technique out there that specifically addresses this problem. If there is, I'd be interested in hearing of it.

Thank you,
Jessica

-----Original Message-----
X-from: Chaoying Ni [mailto:cni-at-UDel.Edu]
Sent: Thursday, November 02, 2006 6:12 AM
To: Cervantes, Jessica

This Question/Comment was submitted to the Microscopy Listserver
using the WWW based Form at
---------------------------------------------------------------------------

Remember this posting is most likely not from a Subscriber, so when replying

please copy both cervantes-at-bendres.com as well as the MIcroscopy
Listserver
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Email: cervantes-at-bendres.com
Name: Jessica Cervantes

Organization: Bend Research Inc

Title-Subject: [Filtered] TEM- EDS on vitrified samples

Question: I'm trying to determine whether EDS analysis can be performed
successfuly on vitrified cryo TEM samples. I have asked around, and done a
few brief literature searches for information on this topic, and haven't got
any good answers.

If anyone has any experience in this area, I'd love to hear from you.

Thanks,
Jessica Cervantes



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From: cni-at-udel.edu
Date: Thu, 2 Nov 2006 12:21:32 -0600
Subject: [Microscopy] viaWWW: TEM- EDS on vitrified samples

Contents Retrieved from Microscopy Listserver Archives
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OK. You are right about the possible complication you may run into while you
focus a beam onto a particle you want to analyze. I can see the scenario
that could happen assuming your particle is non-volatile: amorphous H2O --}
crystal H2O + evaporation, left with your particle. I don't see a problem
until you have to realize analyzing/mapping the interior and exterior
composition of a 100nm solid particle itself sometimes could be a little
tricky. If the particle itself is volatile, then good luck and the work
should be publishable.
-cni


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Email: cervantes-at-bendres.com
Name: Jessica Cervantes

Organization: Bend Research Inc

Title-Subject: [Filtered] TEM- EDS on vitrified samples

Question: I'm trying to determine whether EDS analysis can be performed
successfuly on vitrified cryo TEM samples. I have asked around, and done a
few brief literature searches for information on this topic, and haven't got
any good answers.

If anyone has any experience in this area, I'd love to hear from you.

Thanks,
Jessica Cervantes




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From: tivol-at-caltech.edu
Date: Thu, 2 Nov 2006 13:13:31 -0600
Subject: [Microscopy] Re: viaWWW: TEM- EDS on vitrified samples

Contents Retrieved from Microscopy Listserver Archives
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On Nov 1, 2006, at 7:33 PM, cervantes-at-bendres.com wrote:

} Question: I'm trying to determine whether EDS analysis can be
} performed successfuly on vitrified cryo TEM samples. I have asked
} around, and done a few brief literature searches for information on
} this topic, and haven't got any good answers.
}
} If anyone has any experience in this area, I'd love to hear from you.
}
Dear Jessica,
I did some EDS on the HVEM at Albany on cryo samples, but our set-up
was somewhat unusual, so you may have some problems related to the
geometry of your instrument. We had our detector mounted so that it
looked upward at the specimen at an angle corresponding to a minimum in
the brehmsstrahlung distribution, and we tilted the specimen to an
angle so that the specimen plane bisected the angle between the beam
direction and the detector angle. Our anticontaminator was a blade
located between the specimen and the objective aperture--in the HVEM
there is a lot of room between the pole pieces. The specimen was a
foram with a lot of Si in it, so I got a very good peak and low
background. There was essentially no difference between EDS on RT
samples and this sample; however, since there is usually a lot of ice
and relatively little specimen in a given volume, you may have some S/N
problems unless you are looking for an element that is very abundant.
Good luck.
Yours,
Bill Tivol, PhD
EM Scientist and Manager
Cryo-Electron Microscopy Facility
Broad Center, Mail Code 114-96
California Institute of Technology
Pasadena CA 91125
(626) 395-8833
tivol-at-caltech.edu


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From: Walter.Bobrowski-at-pfizer.com
Date: Thu, 2 Nov 2006 13:39:15 -0600
Subject: [Microscopy] RE: viaWWW: TEM- EDS on vitrified samples

Contents Retrieved from Microscopy Listserver Archives
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Jessica, not specifically cryo-TEM, but we performed EDS on lyophilized,
vitrified (slam freezing) cryo-sections back in '84. Here is the
reference:

Harding CV, Susan S, Bobrowski W
Elemental profiles in cryosections and frozen-dried bulk specimens of
the normal lens.
Ophthalmic Res. 1984;16(5):276-83.

If you need it, I can send you a PDF of the publication.
Best regards,

Walter F. Bobrowski
Sr. Scientist
Pfizer Global R&D
2800 Plymouth Rd.
Ann Arbor, MI 48105

TEL: 734-622-7814
FAX: 734-622-5718

"The ultimate human freedom is the ability to choose one's attitude in a
given set of circumstances." -Viktor Frankl


------------------------------------------------------------------------
---

Email: cervantes-at-bendres.com
Name: Jessica Cervantes

Organization: Bend Research Inc

Title-Subject: [Filtered] TEM- EDS on vitrified samples

Question: I'm trying to determine whether EDS analysis can be performed
successfuly on vitrified cryo TEM samples. I have asked around, and
done a few brief literature searches for information on this topic, and
haven't got any good answers.

If anyone has any experience in this area, I'd love to hear from you.

Thanks,
Jessica Cervantes
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From: gary-at-gaugler.com
Date: Thu, 2 Nov 2006 15:43:17 -0600
Subject: [Microscopy] EBSD polishing system

Contents Retrieved from Microscopy Listserver Archives
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Hi Listers:

When I visited Zeiss in Germany, they had a reasonable
size unit that polished small to large (metallurgical)
samples using plasma. The unit I think sat on a table.
It had a slide to the right cover to insert the specimen,
then it would slide back and lock. There was a color
flat panel LCD display on the far right of the unit to
concoct and recall recipes. This was Zeiss' standard
way of preparing and cleaning specimens. It was a very
nice unit and was reported to be quite reliable and produced
excellent results.

Does anyone know what this system might be? I did
contact Heiner but so far, no response.

tnx,
gary g.


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From: michael-at-shaffer.net
Date: Fri, 3 Nov 2006 06:07:49 -0600
Subject: [Microscopy] RE: EBSD polishing system

Contents Retrieved from Microscopy Listserver Archives
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Gary writes ...

} When I visited Zeiss in Germany, they had a reasonable size
} unit that polished small to large (metallurgical) samples
} using plasma. The unit I think sat on a table.
} ...
}
} Does anyone know what this system might be? I did contact
} Heiner but so far, no response.

It may have been something akin to the JEOL SM-09010 "cross section
polisher"

http://www.jeol.com/PRODUCTS/SamplePreparationEquipment/CrossSectionPolisher
/tabid/161/Default.aspx

cheerios :o)
michael shaffer

SEM/MLA Research Coordinator
{http://www.mun.ca/creait/maf/}
Inco Innovation Centre
Memorial University
St. John's, Newfoundland



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From: Walter.Bobrowski-at-pfizer.com
Date: Fri, 3 Nov 2006 07:57:56 -0600
Subject: [Microscopy] "Spotty" Immunolabeling on Resin-Embedded Samples

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Occasionally we encounter situations where, following pretreatments, we
achieve successful immunolabeling on resin-embedded thick sectioned
samples, but only in distinct areas of the tissue section, where as the
rest of the section is unexpectedly unlabelled. What is interesting is
that the pattern of (inconsistent) labeling is fairly consistent among
all the replicate sections on the glass slide, which randomly dry down
in various orientations. At other times, the entire tissue section is
labeled successfully.

Has anyone encountered this, and if so, is there an explanation? We're
assuming it's a technique issue rather than an issue with either the
tissue itself or the resin matrix.

Best regards,


Walter F. Bobrowski
Sr. Scientist
Pfizer Global R&D
2800 Plymouth Rd.
Ann Arbor, MI 48105

TEL: 734-622-7814
FAX: 734-622-5718

"The ultimate human freedom is the ability to choose one's attitude in a
given set of circumstances." -Viktor Frankl

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From: rcommon-at-msu.edu
Date: Fri, 3 Nov 2006 09:13:08 -0600
Subject: [Microscopy] Quantifying specific staining

Contents Retrieved from Microscopy Listserver Archives
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I need to quantify total specific staining on immunolabeled microscope
slides. I did this many years ago with an old DOS image analysis program
(Jandel's JAVA) using the Beer-Lambert equation to compute the total
absorbance on a pixel by pixel basis. Does anybody know if there are
plug-ins or macros available to do this with ImageJ? I would prefer to use
software with a history of use and citation, if possible. Alternatively, is
there a better way to quantify staining?

Ralph Common
Michigan State University
Dept. of Physiology


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From: gary-at-gaugler.com
Date: Fri, 3 Nov 2006 10:32:47 -0600
Subject: [Microscopy] Re: EBSD polishing system

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Its purpose was to polish specimens. Now that I look
at the several responses, it must have been an ion mill
type of system. It looks similar to the Fishione system
in size but the right half of the cover slides to the right
to open the chamber. The control console is a flat panel
LCD on an articulating arm. As I recall, it used only
Ar.

gary g.



At 02:57 AM 11/3/2006, you wrote:
} Dear Gary,
}
} Are you sure it polished as well? I've
} seen cleaners (Oxygen plasma to remove surface
} grot), but I've never heard of a
} polisher/etcher for SEM work. [Although I have
} done reactive ion etching of semiconductors using (halogenated) hydrocarbons.]
}
} Was it anything like the Fishione
} instruments 1020? http://www.fischione.com/products/model_1020.asp
}
} Austin
}
} P.S. It's very unlikely, but was it was an ion-beam miller?
} http://www.gatan.com/specimenprep/691_pips.html
} You can do very nice EBSD prep on small areas
} using a highly tilted specimen } 80°, low kV
} ( {5keV) and a defocused beam. It can also remove surface grot.
}
} P.P.S. There are other plasma etcher manufacturers, e.g. SPI.
} http://www.2spi.com/catalog/instruments/plasma-cleaner.shtml
}
} ----- Original Message ----- From: {gary-at-gaugler.com}
} To: {AuntDaisy-at-gmail.com}
} Sent: Thursday, November 02, 2006 9:49 PM
} Subject: [Microscopy] EBSD polishing system
}
}
} }
} }
} }
} } ----------------------------------------------------------------------------
} } The Microscopy ListServer -- CoSponsor: The Microscopy Society of America



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7, 23 -- To: ADay {auntdaisy-at-gmail.com}
7, 23 -- From: Gary Gaugler {gary-at-gaugler.com}
7, 23 -- Subject: Re: [Microscopy] EBSD polishing system
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From: r-holdford-at-ti.com
Date: Fri, 3 Nov 2006 18:08:07 -0600
Subject: [Microscopy] EBSD polishing system

Contents Retrieved from Microscopy Listserver Archives
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Gary: I'm wondering if it was an RES100 ion mill by Bal-Tec. I demo'd
the RES100 back when it first came out and if my memory is reliable
(sometimes not) it had a sliding cover. I don't think they sell the
RES100 anymore. I recommend the RES101, the latest generation of that
tool, which I have and use almost everyday. I use it for SEM sample
clean-up and cross-section delineation. In the USA, Bal-Tec is rep'd by
RMC Boeckler.
http://www.baltec-rmc.com/cms/index.cfm/path/17933/26002/24159/25864/
PS: there are NO spaces in the URL and I have no financial interest in
the company.

gary-at-gaugler.com wrote:
} ----------------------------------------------------------------------------
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} ----------------------------------------------------------------------------
}
} Its purpose was to polish specimens. Now that I look
} at the several responses, it must have been an ion mill
} type of system. It looks similar to the Fishione system
} in size but the right half of the cover slides to the right
} to open the chamber. The control console is a flat panel
} LCD on an articulating arm. As I recall, it used only
} Ar.
}
} gary g.
}
}
}
} At 02:57 AM 11/3/2006, you wrote:
}
} } Dear Gary,
} }
} } Are you sure it polished as well? I've
} } seen cleaners (Oxygen plasma to remove surface
} } grot), but I've never heard of a
} } polisher/etcher for SEM work. [Although I have
} } done reactive ion etching of semiconductors using (halogenated) hydrocarbons.]
} }
} } Was it anything like the Fishione
} } instruments 1020? http://www.fischione.com/products/model_1020.asp
} }
} } Austin
} }
} } P.S. It's very unlikely, but was it was an ion-beam miller?
} } http://www.gatan.com/specimenprep/691_pips.html
} } You can do very nice EBSD prep on small areas
} } using a highly tilted specimen } 80°, low kV
} } ( {5keV) and a defocused beam. It can also remove surface grot.
} }
} } P.P.S. There are other plasma etcher manufacturers, e.g. SPI.
} } http://www.2spi.com/catalog/instruments/plasma-cleaner.shtml
} }
} } ----- Original Message ----- From: {gary-at-gaugler.com}
} } To: {AuntDaisy-at-gmail.com}
} } Sent: Thursday, November 02, 2006 9:49 PM
} } Subject: [Microscopy] EBSD polishing system
} }
} }
} }
} } }
} } } ----------------------------------------------------------------------------
} } } The Microscopy ListServer -- CoSponsor: The Microscopy Society of America
} } } To Subscribe/Unsubscribe --
} } } http://www.microscopy.com/MicroscopyListserver
} } } On-Line Help http://www.microscopy.com/MicroscopyListserver/FAQ.html
} } } ----------------------------------------------------------------------------
} } }
} } } Hi Listers:
} } }
} } } When I visited Zeiss in Germany, they had a reasonable
} } } size unit that polished small to large (metallurgical)
} } } samples using plasma. The unit I think sat on a table.
} } } It had a slide to the right cover to insert the specimen,
} } } then it would slide back and lock. There was a color
} } } flat panel LCD display on the far right of the unit to
} } } concoct and recall recipes. This was Zeiss' standard
} } } way of preparing and cleaning specimens. It was a very
} } } nice unit and was reported to be quite reliable and produced
} } } excellent results.
} } }
} } } Does anyone know what this system might be? I did
} } } contact Heiner but so far, no response.
} } }
} } } tnx,
} } } gary g.
} } }
} } }
} } } ==============================Original Headers==============================
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} 7, 23 -- From: Gary Gaugler {gary-at-gaugler.com}
} 7, 23 -- Subject: Re: [Microscopy] EBSD polishing system
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--
~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~
Becky Holdford (r-holdford-at-ti.com)
972-995-2360
972-648-8743 (pager)
SC Packaging FA Development
Texas Instruments, Inc.
Dallas, TX
~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~


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From: dgmorgan-at-ucdavis.edu
Date: Sat, 4 Nov 2006 12:29:49 -0600
Subject: [Microscopy] viaWWW: Tantalum foils

Contents Retrieved from Microscopy Listserver Archives
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Email: dgmorgan-at-ucdavis.edu
Name: David Morgan

Organization: UC Davis

Title-Subject: [Filtered] Tantalum foils

Question: Hi,

I find myself in need of a tantalum foil suitable for TEM and since I am just getting into the field of materials science, I am hoping that this sort of sample is commercially available. Are such things available and can anyone suggest a vendor? Thanks in advance.

---------------------------------------------------------------------------

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From: elchem33-at-gmail.com
Date: Sat, 4 Nov 2006 12:31:07 -0600
Subject: [Microscopy] viaWWW: TEM alignment problem Help needed

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Email: elchem33-at-gmail.com
Name: Marco Puzi

Organization: Dep of Chemistry and Biochemistry, Univ Split, Croatia

Title-Subject: [Filtered] TEM alignment problem

Question: Hi!

During the alignment of our Jeol JEM-200CX TEM something has gone wrong. I suppose that user by mistake used the gun/beam tilt controls instead the shift (trans) controls, or he altered the sequence for gun and condenser alignment; after that, it seems that he used other controls (deflector coils X and Y corrector/compensator, beam displacement compensating coil... I even suspect that he mechanically moved the intermediate and projector lens) in attempt to align the microscope. As a result, the microscope is terribly misaligned and I can't seem to get it back in the aligned state following the alignment procedure given in Jeol manual. After the gun and condenser alignment steps everything seems fine (beam is centered on the screen and expands uniformly). However, when cond alignment wobbler is turned on, the beam separates into two spots, and one spot is blurred to aprox. 1 cm in diameter, while other remains focused! Also, when specimen is placed in microscope, image moves badly during focusing and becomes blurred during the change of illumination. I suppose that all this effects are due to the tilted beam.

Does anybody know the alignment procedure that works in similar situations?

Also, I will be grateful if anyone could explain me what beam displacement compensating coils (located between condenser and objective lens, just below beam deflector coils) exactly do (this topic is not covered in manual).

Thanx in advance.
Marco


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From: zaluzec-at-microscopy.com
Date: Sat, 4 Nov 2006 12:44:14 -0600
Subject: [Microscopy] Re: viaWWW: Tantalum foils

Contents Retrieved from Microscopy Listserver Archives
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David

You can buy sheets of Tantalum metal at Goodfellow
They sell small quantities with high purity for research.

Here is the link.

http://www.goodfellow.com/

Just search for tantalum foils.

These are generally suitable for you to electropolish to make TEM samples. Warning
I believe anumber of the polishing solutions tend to use HF, nasty stuff. If your
new to TEM sample method make sure you know the hazards of HF.



Nestor
Your Friendly Neighborhood SysOp





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From: cgarber-at-2spi.com
Date: Sat, 4 Nov 2006 14:56:41 -0600
Subject: [Microscopy] Tantalum foil on a grid

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

D. Morgan asked:
=============================================
I find myself in need of a tantalum foil suitable for TEM and since I am just getting into the field of materials science, I am hoping that this sort of sample is commercially available. Are such things available and can anyone suggest a vendor? Thanks in advance.
=============================================
If you are talking about a tantalum foil on a TEM grid, see URL
http://www.2spi.com/catalog/standards/aem.shtml

This is a standard foil product produced by SPI Supplies.

Disclaimer: SPI Supplies is the manufacturer of this foil sample.

Chuck
===================================================
Charles A. Garber, Ph. D. Ph: 1-(610)-436-5400
President
SPI SUPPLIES FAX: 1-(610)-436-5755
PO BOX 656 e-mail: cgarber-at-2spi.com
West Chester, PA 19381-0656 USA Cust. Service: spi2spi-at-2spi.com


Look for us!
############################
WWW: http://www.2spi.com
############################
==================================================






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From: drteddunne-at-yahoo.com
Date: Sat, 4 Nov 2006 23:37:29 -0600
Subject: [Microscopy] Re: Tantalum foil on a grid

Contents Retrieved from Microscopy Listserver Archives
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Also available from other electron microscope supply
companies. You might want to do a price check.

Ted Dunn
The EMscope Company Ltd.
Thailand


D. Morgan asked:
=============================================
I find myself in need of a tantalum foil suitable for
TEM

--- cgarber-at-2spi.com wrote:

=============================================
} If you are talking about a tantalum foil on a TEM
} grid, see URL
} http://www.2spi.com/catalog/standards/aem.shtml
}
} This is a standard foil product produced by SPI
} Supplies.
}
} Disclaimer: SPI Supplies is the manufacturer of
} this foil sample.
}
} Chuck
} ===================================================
} Charles A. Garber, Ph. D. Ph:
} 1-(610)-436-5400
} President
} SPI SUPPLIES FAX:
} 1-(610)-436-5755
} PO BOX 656
} e-mail: cgarber-at-2spi.com
} West Chester, PA 19381-0656 USA Cust. Service:
} spi2spi-at-2spi.com
}
}
} Look for us!
} ############################
} WWW: http://www.2spi.com
} ############################
} ==================================================
}
}
}
}
}
}
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From: ron.doole-at-materials.ox.ac.uk
Date: Sun, 5 Nov 2006 15:48:49 -0600
Subject: [Microscopy] Re: viaWWW: TEM alignment problem Help needed

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Dear Marco,

It sounds like you have a user you don't need!!

However, things may not be as bad as you think. You say that the user may have
adjusted the IL and PL mechanical alignments, that is possible but in over 35
years of looking after EMs in government and university labs I've never met a
user who adjusted the mechanical alignment. You will soon tell if they have
because the Mag images and Diff patterns will not be centered when you go down
in mag or camera length. Yes - go down not up. If the image is not quite
centered at 1K it will be a long way out at 100K but if it's a bit out at 100K
it will be centered at 1K.

So to your Beam Compensation controls. You have two sets of 4 four coils one
below the other, each set has 2 X coils and 2 Y coils with X and Y set at
90deg to each other. These are often called Beam Shift (top set) and Beam Tilt
(lower set). However both sets are used to give shift and tilt.
Imagine you have a beam running down the column and you pass a current through
the top X set, this will deflect the beam through an angle - alpha. If you
then pass an equal current in the opposite direction through the X coils in
the lower set the beam will be deflected through an angle, alpha, but in the
opposite direction. The beam will now be parallel with the original direction
but moved (shifted) a little.
Now apply a higher current through the lower set and the beam will be
deflected through a greater angle. If higher current is set correctly
the beam will pass through the same point in the specimen as the undefleted
beam would have but now it is at an angle (beta) to the original beam. This is
pure tilt, increase the current through both the upper and lower sets in the
same ratio and the angle (beta) changes. The beam shift control adjusts the
coils in the correct ratio to shift and the beam tilt control adjusts them in
the correct ratio to tilt. This is a whole lot easier to understand if you
draw it out.

With the beam compensators you are setting up pure tilt onto the specimen. The
microscope wobbles the beam and you adjust the ratio until both spots
coincide. Under this condition when you tilt the beam (eg. for dark field
imaging) it does not move off the area of interest.

Now what about your problem - I think that the distortion you see is caused by
the beam being deflected too far from the optic axis. First (assuming you have
a side entry 200CX) make sure the specimen is at eucentric height (image does
not move when you tilt the specimen rod) then focus the specimen. If you have
a top entry 200CX then set the objective current to the correct value.
Next set the beam tilts to their mid positions, that is when both indicator
arrows are lit or when it changes from one to the other. If the beam tilt is a
long way out the image will move a lot as you adjust the objective lens
current.

Now try the beam compensation again. I suspect that either the objective lens
current is wrong or the beam tilt is a long way out to begin with.

Of course it is always possible that the user has adjusted the mechanical
alignments or that lenses, deflectors or HT are not working properly but in my
experience that is less likely.

I hope this helps.

Good luck,
Ron



In message {200611041839.kA4IdG3M012999-at-ns.microscopy.com} elchem33-at-gmail.com
writes:
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} Email: elchem33-at-gmail.com
} Name: Marco Puzi
}
} Organization: Dep of Chemistry and Biochemistry, Univ Split, Croatia
}
} Title-Subject: [Filtered] TEM alignment problem
}
} Question: Hi!
}
} During the alignment of our Jeol JEM-200CX TEM something has gone wrong. I
suppose that user by mistake used the gun/beam tilt controls instead the shift
(trans) controls, or he altered the sequence for gun and condenser alignment;
after that, it seems that he used other controls (deflector coils X and Y
corrector/compensator, beam displacement compensating coil... I even suspect
that he mechanically moved the intermediate and projector lens) in attempt to
align the microscope. As a result, the microscope is terribly misaligned and I
can't seem to get it back in the aligned state following the alignment
procedure given in Jeol manual. After the gun and condenser alignment steps
everything seems fine (beam is centered on the screen and expands uniformly).
However, when cond alignment wobbler is turned on, the beam separates into two
spots, and one spot is blurred to aprox. 1 cm in diameter, while other remains
focused! Also, when specimen is placed in microscope, image moves !
} badly during focusing and becomes blurred during the change of
illumination. I suppose that all this effects are due to the tilted beam.
}
} Does anybody know the alignment procedure that works in similar situations?
}
} Also, I will be grateful if anyone could explain me what beam displacement
compensating coils (located between condenser and objective lens, just below
beam deflector coils) exactly do (this topic is not covered in manual).
}
} Thanx in advance.
} Marco
}
}
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} ==============================Original Headers==============================
} 12, 14 -- From zaluzec-at-microscopy.com Sat Nov 4 12:31:07 2006
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--
Mr. Ron Doole Department of Materials
Senior Instrumentation Engineer. University of Oxford.
Phone +44 (0) 1865 273701 Parks Road. Oxford. OX1 3PH
Fax +44 (0) 1865 283333 ron.doole-at-materials.ox.ac.uk

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From: mmiralles-at-pi.ac.ae
Date: Mon, 6 Nov 2006 01:26:43 -0600
Subject: [Microscopy] Open Day Ideas??

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html


Hello again fellow microscopists,

We shall be having an Open Day for students next week and one of the
highlights this time is 'showcasing' our newly acquired SEM unit.
Any ideas on how I could present the new toy to them and catch their
attention? Posters or movies you could share perhaps? =)

Our unit is a FEI Quanta 200, by the way.

Thanks and best regards,


Melina L. Miralles
PGSc Laboratory Technician
The Petroleum Institute
Tel: 02-5085497 (Office)
Tel: 02-5085539/5481 (Lab)
Fax : 02-5085423



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From: benada-at-biomed.cas.cz
Date: Mon, 6 Nov 2006 04:14:43 -0600
Subject: [Microscopy] Battery back up trouble

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Hello all,
we have following trouble:
"Panasonic Lithium battery BR-2/3A 3V" which are used for battery back up
in Philips CM12 electron microscope were exhausted after one year of use.
This occurred for the second time. Is this normal ?
Previously we had to replace them after several years but now we have to
use the third set of batteries in two years. Has anybody any suggestion or
hint?
Thanking you in advance.
Oldrich

-----------------------------------------------
Oldrich Benada
Institute of Microbiology, Acad. Sci. CR
Videnska 1083
142 20 Prague 4
Czech Republic





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From: beaurega-at-westol.com
Date: Mon, 6 Nov 2006 08:54:56 -0600
Subject: [Microscopy] Re: Carbon Coater questions

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Rtch:

I used a 1978 vintage Edwards 306A evaporator. I found a local
microscopist with some 1980s E306A documentation and got some copies made.
I have repaired or reconditioned at least three different evaporators over
the years including an E306.

I believe CB1 and CB2 are 8 amp ganged double pole thermal circuit breakers
that are manually reset and latched closed. This ganging on CB2 is set up
so that tripping either CB2-8A -OR- CB2-I/LOCK will cut off power through
the two ILC switch contacts (shown in diagrams) and that are controlled
(not shown) by the ILC "box". The ITC box is a contactor relay coil.
The only normal way to trip the CB2-8A half is to have a current over 8
amps. For example, the RP motor stalls out and the current rises.
Breaking circuit continuity near CB2-8A or shorting across that half of CB2
will not trip CB2-I/LOCK. CB2-I/LOCK holds an electrical latch on the ILC
"box" contactor coil and that keeps the power turned on to the E306 through
both sets of contacts labeled ITC. Since that "relay" coil controls the
ITC contacts, CB2-I/LOCK is a latched power supply safety interlock circuit
switch.
The shunt jumper above the ITC box is shown as an unlabeled wire between
terminals with wires 2 and 8 on them in the terminal block diagram. The
shunt is not shown as an interlock switch.
The analysis of CB2-I/LOCK failure was sent separately. Basically any open
in the ITC box branch circuit between wires 1 and 4 shuts off power.
Any failure in the RP, DP, or Pirani section that causes a higher current
draw through CB2-8A will shut down the power circuits. CB2-8A could be
damaged and tripping out at a lower current, however. Monitor the current
with a clamp-on ammeter to see how close to 8 amps it is running.

You asked about terms. These may be of general interest to E306A owners.
AAV-Air Admit Valve
HT acc- High Tension Accessory or voltage supply. (Shown as a dashed line
rectangular box near the step down transformer, is located between wires 30
& 14, and not labeled as HT in some diagrams.)
LTC- Low Tension Contactor.
CB2 I/LOCK- InterLock branch of ganged Circuit Breaker two
ILC box- InterLock Contactor unit. This is a double pole 230 VAC line
voltage detection relay and is latched ON by pushing the CB2 reset.
Circle X's- Neon indicator lights.

You said, "the auxiliary contacts of 8-Amp circuit breaker CB2 supply mains
power, through a few interlock switches, to a rectangular box labeled
'ILC'." This might mean, "the auxiliary contacts (CB2-I/LOCK) of the dual
8-Amp circuit breaker CB2, supply mains power through an interlock switch
(shunt jumper or link above the ILC box) to a rectangular box labeled
'ILC'. What is this ITC thing?" It's a contactor relay coil.

The ILC box should have a dashed line that goes from it to the dashed line
that connects the two ganged ILC switch contacts in the main 230 VAC power
line feeders. This ILC dashed line would connect near the words MAINS ON
which is really a label for the MAINS neon indicator light on the top
user's panel.

CB1-8A supplies power through "a few interlock switches", some door
interlock switches and to a rectangular box labeled 'LTC' and another
shunt. So what is this LTC thing? It is a contactor or coil that operates
the LTC switch contacts at the far right, IMO. You turn on LT and those
contacts close. That's another missing dashed line to signify remote
control of relay contacts.

You mentioned carbon rod evaporations for a reason. I and others had
problems on the 306A Edwards with the carbon rod holder too. Check all the
connections and clean them, if that is also a problem. Clean the inside
surfaces where the rods go. Most of these older stand alone evaporators
are bulletproof and still valuable. I restored a second evaporator unit
and converted it to the ball bearing operated LADD dual carbon rod and
tungsten basket system. Earlier this year I was studying the theory of
side emissions of electrons from heated tungsten wires and nichrome wires
reputed to cause the false peak. When the wires failed to continue
heating, it was always the tightness of the connections at the W wires that
were the problem. I don't like to torque things too tight. My prolonged
heating and "looser" mechanical connection caused contact failures at the
set screws during this prolonged heating. It was not the fault of the LADD
unit or my home-made tungsten hairpin holder. (I hate fishing out a
slightly bent, jammed and broken W wire from a tiny hole in a wire holder
in my garage.)
I suspect the same type of contact connection problems for the Edwards
carbon rod clamping collars. We really had to torque them very tight.

The rating on CB2-I/LOCK should not be that important but is probably 8
amps at 230 VAC or higher. The ratings should be printed on the items CB2,
CB1, and the ILC contactor itself. I am not sure if CB2 is a slow blow
circuit breaker or not. I'd call Edwards for a new CB2 unit.

HTH,

Paul


At 01:23 PM 11/1/06 -0600, you wrote:
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From: schooley-at-mcn.org
Date: Mon, 6 Nov 2006 10:55:16 -0600
Subject: [Microscopy] Re: Open Day Ideas??

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} ----------------------------------------------------------------------------
} The Microscopy ListServer -- CoSponsor: The Microscopy Society of America

Next WEEK? Well, maybe you can be ready for next year. Microscopy
Today has David Scharf's posters, and Dennis Kunkel has both a nice
poster (see his website) and a really excellent book, "Hidden
Worlds". Elaine Humphrey has 3 delightful 3-D (red-green) books
titled "Extreme 3-D: Your Body, Scary Bugs, & Weird Animals". You
can find info about the books on the MICRO website (URL below).
MICRO's site also has a long hotlinked list of websites that students
can explore after their visit. If you want something to print &
scatter around your walls, go to MICRO's collection of quotes about
microscopy.

Caroline
--
Caroline Schooley
Project MICRO Coordinator
Microscopy Society of America
Box 117, 45301 Caspar Point Road
Caspar, CA 95420
Phone/FAX (707)964-9460
Project MICRO: http://www.microscopy.org/ProjectMICRO

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From: jae5-at-lehigh.edu
Date: Mon, 6 Nov 2006 13:29:32 -0600
Subject: [Microscopy] Reading inside a solid object

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Once again, I have been dipping in to "The New Science of Strong
Materials" by J. E. Gordon. For those of you who do not know, this is
an absolutely wonderful book that tells at a non-technical level what
materials science is all about. Thoroughly recommended if you have not
read it already.

Gordon says that, in ancient Egypt, mummy cases were made by making
papier mâché with papyrus. Some of the papyrus will have writing on it
that might be important. On the other hand, no one would want to break
up the case of a famous mummy to get pieces of papyrus that might have
nothing more on them than somebody's shopping list.

I would have thought that, by now, there ought to be some form of
imaging that would let us read what is on the papyrus while it is still
one of many layers in the unharmed case of the mummy. I would be
pleased to hear either that it has already been done, or that someone is
trying to do it.

Alwyn Eades

--
...........
Alwyn Eades
Department of Materials Science and Engineering
Lehigh University
5 East Packer Avenue
Bethlehem
Pennsylvania 18015-3195
Phone 610 758 4231
Fax 610 758 4244
jae5-at-lehigh.edu


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From: hyi-at-emory.edu
Date: Mon, 6 Nov 2006 14:44:39 -0600
Subject: [Microscopy] (Microscopy) Low contrast

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Dear Microscopy Researchers:

           I remember someone posted a message last year asking for
help with the low contrast problem he was having on his cultured
cells. He stated, after receiving a number of replies, that he has been
using the same protocol for years and never had problem until then. I
have heard a few other people reporting the same thing to
me. Personally, I had an episode like that years ago, but then resolved
the problem by using freshly made osmium. 

           Right now I am experiencing the same problem again, and the
problem persisted even when I used newly ordered osmium solution (4%
aqueous solution). I also used very short dehydration time to minimize
potential lipid lose, but no visible improvement in contrast. 

           I still think this problem has something to do with
osmium. But I would like to see if anyone out there has any new
insight.

           Thank you in advance.


Hong

Emory SOM EM



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From: krensing-at-ucalgary.ca
Date: Mon, 6 Nov 2006 16:56:27 -0600
Subject: [Microscopy] nanotech plasmaprep 100

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Listers,
I have just been given a Nanotech Plasmaprep 100 "Plasma Chemistry Unit"
that may or may not be functional. It looks to be complete other than a
vacuum pump. Does anyone have a manual or wiring diagrams for this unit?
Actually, even someone's operating procedures would be better than nothing.
Thanks for helping.
Kim

--
Kim Rensing Ph.D.
Manager,
Microscopy and Imaging Facility

University of Calgary,
Health Sciences Centre
B129 - 3330 Hospital Drive NW
Calgary, AB, Canada T2N 4N1

403-220-3488
krensing-at-ucalgary.ca

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From: klangwor-at-uoregon.edu
Date: Mon, 6 Nov 2006 23:09:33 -0600
Subject: [Microscopy] viaWWW: Surplus Equipment

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Email: klangwor-at-uoregon.edu
Name: Kurt Langworhty

Organization: Univeristy of Oregon

Title-Subject: [Filtered] Surplus Equipment

Question: We are consolidating our confocal and EM labs to prepare for the construction of our Integrated Sciences Building.

I need to donate/sell some equipment to make room in the lab. I'm trying to find homes for:

Varian VE-10 Vacuum Evaporator

Hughes Laser Defractometer (with laser power supply included)

7 boxes of 4x5in Polaroid 55 SEM film (20/box)

Possibly more to come...

Any interested parties should contact me by email (klangwor-at-uoregon.edu)

Thanks,
Kurt


Thanks,
Kurt

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From: mmiralles-at-pi.ac.ae
Date: Mon, 6 Nov 2006 23:47:22 -0600
Subject: [Microscopy] RE: Open Day Ideas??

Contents Retrieved from Microscopy Listserver Archives
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Thank you so much for all the ideas you have imparted.
I will be using many of it and hopefully get the students interested in
microscopy as well.


Melina L. Miralles
PGSc Laboratory Technician
The Petroleum Institute





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From: zhang.zaoli-at-gmail.com
Date: Tue, 7 Nov 2006 08:09:41 -0600
Subject: [Microscopy] viaWWW: TEM specimen preparation about Li compound

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Email: zhang.zaoli-at-gmail.com
Name: Zaoli

Organization: Ulm univsersity

Title-Subject: [Filtered] TEM specimen preparation about Li compound

Question: Hi,


I am going to carry out the TEM investigation on Li compound single crystals, i.e. LiCoO, or LiFePO4 etc .. I am afraid that routine TEM sample preparation may bring the damage or remove active Li atoms from the sample. does anyone have experience or suggestions on how to prepare TEM samples of such Li compound crystals ? and what kind of damgage could be introduced if a routine TEM sample preparation used ?

thanks in advance,

Zaoli

---------------------------------------------------------------------------

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From: pavi_micro-at-yahoo.com
Date: Tue, 7 Nov 2006 08:10:20 -0600
Subject: [Microscopy] AskAMicroscopist: dark field

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Below is the result of your feedback form (NJZFM-ultra-55). It was submitted by (pavi_micro-at-yahoo.com) from http://www.microscopy.com/Ask-A-Microscopist/Ask-A-Microscopist.html on Monday, November 6, 2006 at 23:57:52
---------------------------------------------------------------------------

Email: pavi_micro-at-yahoo.com
Name: mrs.pavitra jain

Organization: Microbiologist

Education: Graduate College

Location: Hubli,India

Question: What is dark field microscope

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From: samuel_meulenyzer-at-yahoo.fr
Date: Tue, 7 Nov 2006 08:43:18 -0600
Subject: [Microscopy] SEM (EDX + WDX) - TEM - X-Ray microtomography - Engineer in material characterizations, micro analysis technique

Contents Retrieved from Microscopy Listserver Archives
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Hello dear,

As a material science characterizations engineer with 5 years of work experience, I am searching for a SEM / TEM / SIMS / X-Ray microtomography position, in a laboratory or industrial lab. I have good skills in Electron Microscopy (materials analysis) and in X-Ray microtomography systems. Please ask me (mail adress : samuel_meulenyzer-at-yahoo.fr) my Curriculum Vitae and more details if you are intersted.

As an european citizen, I am free to work anywhere.

Thanks very much.

Samuel Meulenyzer








___________________________________________________________________________
Découvrez une nouvelle façon d'obtenir des réponses ŕ toutes vos questions !
Profitez des connaissances, des opinions et des expériences des internautes sur Yahoo! Questions/Réponses
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From: frank.karl-at-degussa.com
Date: Tue, 7 Nov 2006 08:48:20 -0600
Subject: [Microscopy] Re: AskAMicroscopist: dark field

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http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

What an interesting question.

A Dark field scope produces an image of brightly illuminated objects on a
dark background. It was one of the earliest attempts to increase the
resolution and detectability of objects.

Abbe's theory of resolution states that for good resolution you need to
capture two of three possible rays. This is assuming that each microscopic
object acts as a diffraction grating. This isn't too bad of an assumption.
The three rays are one direct, undeviated ray from the sample and two
primary diffracted rays. (We like to think of these thought experiment and
ray diagrams has two dimensional drawing on a sheet of paper). For some
subjects the diffracted rays fall outside of the light accepting ability of
the objective and these objects can not be resolved. (Bummer!)

One approach is to tilt or move the condense off center (Many of the old
medical grade scopes had this ability). This allows the undeviated ray and
one diffracted ray to enter the front lens of the objective. This produces
a dark background and white illuminated subjects.

A second approach is to use a central stop in the condenser to block the
central ray and allow only highly angled rays to illuminated the subject.
The diffracted rays from these angled light rays form the image.

You often need a powerful light source or work in a very dark room with
dark adapted eyes because you are throwing away a lot of light with a
central stop. Special condensers were, and I believe, are still made to
efficiently produce darkfield illumination.

Newer illuminating systems (like phase contrast) have replaced a lot of
darkfield work. Still some incredible images can be formed with darkfield.
One easy short cut is to use a phase contrast scope and select a condenser
phase ring larger than the ring in your objective.

Best wishes...........

Frank Karl
Degussa Coproration




pavi_micro-at-yahoo.
com To: frank.karl-at-degussa.com
cc:
11/07/2006 08:12 Subject: [Microscopy] AskAMicroscopist: dark field
AM
Please respond to
pavi_micro








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Organization: Microbiologist

Education: Graduate College

Location: Hubli,India

Question: What is dark field microscope

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From: Elliott-at-arizona.edu
Date: Tue, 7 Nov 2006 09:11:05 -0600
Subject: [Microscopy] Re: AskAMicroscopist: dark field

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

There is a description of Dark Field Microscopy at
http://micro.magnet.fsu.edu/primer/techniques/darkfieldindex.html

David


On Nov 7, 2006, at 7:15 AM, pavi_micro-at-yahoo.com wrote:

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From: baskin-at-bio.umass.edu
Date: Tue, 7 Nov 2006 09:49:24 -0600
Subject: [Microscopy] dark field and beyond

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Microscopists,
While Frank Karl is undoubtedly correct that the spur to
invent dark field was based on resolution and tilting beams, I wanted
to mention that there is a useful rubric for classifying types of
microscopy, and that is based on contrast. Like this:

Brightfield: Absorption contrast
Darkfield: Scattering contrast
Fluorescence: Fluorescence contrast
Phase: Optical path contrast
Nomarski: gradient in optical path contrast
Polarized light: birefringence (molecular alignment) contrast

In each case, the microscope takes advantage of a specific
kind of interaction between light and matter to generate contrast (of
course there are overlaps, eg scattering contributes to contrast in
a brightfield microscope, etc).

(The Nomarski one may be hard to understand, this kind of
optics gives rise to a signal whenever the gradient in optical path
in a local region is different than what the gradient is in the
background).

Hope this helps,
Tobias



}
}
} What an interesting question.
}
} A Dark field scope produces an image of brightly illuminated objects on a
} dark background. It was one of the earliest attempts to increase the
} resolution and detectability of objects.
}
} Abbe's theory of resolution states that for good resolution you need to
} capture two of three possible rays. This is assuming that each microscopic
} object acts as a diffraction grating. This isn't too bad of an assumption.
} The three rays are one direct, undeviated ray from the sample and two
} primary diffracted rays. (We like to think of these thought experiment and
} ray diagrams has two dimensional drawing on a sheet of paper). For some
} subjects the diffracted rays fall outside of the light accepting ability of
} the objective and these objects can not be resolved. (Bummer!)
}
} One approach is to tilt or move the condense off center (Many of the old
} medical grade scopes had this ability). This allows the undeviated ray and
} one diffracted ray to enter the front lens of the objective. This produces
} a dark background and white illuminated subjects.
}
} A second approach is to use a central stop in the condenser to block the
} central ray and allow only highly angled rays to illuminated the subject.
} The diffracted rays from these angled light rays form the image.
}
} You often need a powerful light source or work in a very dark room with
} dark adapted eyes because you are throwing away a lot of light with a
} central stop. Special condensers were, and I believe, are still made to
} efficiently produce darkfield illumination.
}
} Newer illuminating systems (like phase contrast) have replaced a lot of
} darkfield work. Still some incredible images can be formed with darkfield.
} One easy short cut is to use a phase contrast scope and select a condenser
} phase ring larger than the ring in your objective.
}
} Best wishes...........
}
} Frank Karl
} Degussa Coproration
}
}
}
}
}
}
} pavi_micro-at-yahoo.
} com To:
} frank.karl-at-degussa.com
}
} cc:
} 11/07/2006 08:12 Subject:
} [Microscopy] AskAMicroscopist: dark
} field
}
} AM
} Please respond
} to
}
} pavi_micro
}
}
}
}
}
}
}
}
}
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}
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--
_ ____ __ ____
/ \ / / \ / \ \ Tobias I. Baskin
/ / / / \ \ \ Biology Department
/_ / __ /__ \ \ \__ 611 N. Pleasant St.
/ / / \ \ \ University of Massachusetts
/ / / \ \ \ Amherst, MA, 01003
/ / ___ / \ \__/ \ ____
http://www.bio.umass.edu/biology/baskin/
Voice: 413 - 545 - 1533 Fax: 413 - 545 - 3243

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From: amich-at-ufl.edu
Date: Tue, 7 Nov 2006 10:09:18 -0600
Subject: [Microscopy] LR white question

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Dear Colleagues,

Did anyone has an experience with LR White polymerization at the
temperature range 45-55C? Could you, please, suggest the
appropriate embedding/curing protocol and your vendor of choice?
My protocol involves the cryofixation, cryo substitution with
acetone (aldehydes or osmium fixatives are no-no). The UV
polymerization could be difficult to achieve due to the technical
limitations; and temperatures exceeding 55C are damaging for some
of the structures. The 46-49C range is absolutely preferred.
Thank you in advance,
Albina


MIKHAYLOVA,ALBINA, PhD
Materials Science and Engineering
University of Florida
PO Box 116400
Gainesville, Florida 32611
Phone: (352) 392-6533
Fax: (352) 392-3771
E-Mail: amich-at-ufl.edu


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From: jfmjfm-at-umich.edu
Date: Tue, 7 Nov 2006 11:16:20 -0600
Subject: [Microscopy] unsubscribe

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unsubscribe


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From: larry-at-cymru.freewire.co.uk
Date: Tue, 7 Nov 2006 14:33:09 -0600
Subject: [Microscopy] Re: Reading inside a solid object

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http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

} ----------------------------------------------------------------------------
} The Microscopy ListServer -- CoSponsor: The Microscopy Society of America
Hi Alwyn,

I wonder if terahertz microwave imaging might work?

Airport security are experimenting with this in
the UK - apparently, it can image, in real time,
underneath people's clothes to see if hidden
weapons, etc, are being carried. Seems a lot more
sensitive and controllable than X-rays. Various
concerns about security staff having fun watching
'naked' passengers ....

Perhaps some careful tuning would make it
possible image at various depths and select
different materials to 'see' this writing ...?
--
Larry Stoter

PLEASE NOTE - Agressive SPAM filtering is
employed. If you don't get a reply to e-mails,
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From: underwoo-at-u.washington.edu
Date: Tue, 7 Nov 2006 15:45:13 -0600
Subject: [Microscopy] cryothin sectioning millipore filter

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Dear Fellow Microscopist,

My question is: What type of commercially available membrane such as a type of millipore filter
could be used as a substrate to grow cells (keratinocytes) and subsequently fix, cryoprotect and
ultrathin cryosection the membrane/cells intact?
If anyone has done this, I would certainly appreciate some advice.

Robert Underwood
Universtiy of Washington
Dermatology


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4, 21 -- Subject: [Microscopy] cryothin sectioning millipore filter
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From: ph2-at-sprynet.com
Date: Tue, 7 Nov 2006 15:58:10 -0600
Subject: [Microscopy] dark field and beyond

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

A few more Comments on Darkfield - but I like the contrast comparison.

1. Part I - Darkfield history

Darkfield has been around a long time (1800s), including paraboloid and ellipsoid condenser uses.

Classically done with a stop in the condenser or with a reflecting objective.

But can be done with a stop on the objective, at the light source, or another focal plane before the eye.

Modifications of this are:

A) with dispersion staining [promoted by Crossman as well as Brown and McCrone in the 1960s, but actually first described by Dodge in Am. Min. in 1948]

or

B) critical darkfield (you can look up an article by Ted Clarke in Microscopy Today on critical Darkfield which comes from: Havics & Clarke: “Critical Darkfield and Its Application to Asbestos Analysis” presented at Inter/Micro-2002, June 24-27, 2002, Chicago, IL.; there are some nice diagrams of the process of light interaction)

2. Part II - Contrast Issues

Phase

I(x’) proportional to [1 - (2*(phase dif)(x’)) ]
I = intensity
Thus linear with phase change (RI*thickness)
useful for up to 1/2 wavelength
Best at {1/10 wavelength

Darkfield

I(x’) proportional to (phase dif)^2 (ingoring secondary terms)
Thus not so linear with phase change
And useful for outlines or very small particles/differences

Hoffman Modulation Contrast

dI = If*(Phase dif)*(TB - TG)*2cos(theta/w)
TB = transmittance in bright area
TG = transmittance in gray area
W = width of slit
Theta = angle from perpedicular to slit
Thus non-linear but smoothed

Normaski DIC

I proportional to d(dif phase)/dx (simplified)
useful from } 1/10 wavelength
Up to 1 wavelength
best above 1/2 wavelength

[Source for above: Havics: “Asbestos Fiber Counting by Different Optical Contrast Techniques”, presented at Inter/Micro-2003, July 7-10, 2003, Chicago, IL.; I'm trying to get an article out on this in the next 3 months or so which is why it's at my fingertips]

3. Part III additional Comments

Resolution of Darkfield} Hoffman} Phase } DIC } Brightfield based on my tests using a resolution test slide (HSE/NPL test slide). Fluorescence is too media dependent to make a broad statement but does better than Hoffman using fluorescent spheres and about the same as darkfield.

Resolution does not necessarily mean detectability. Contrast is better for detectability of an object whereas resolution is better for defining the structure once detected.

A Dark background in general increases detectability vs a bright background.

Tony



..........................................................................
Andrew Anthony "Tony" Havics, CHMM, CIH, PE
pH2, LLC
PO Box 34140
Indianapolis, IN 46234
(317) 752-6386
(317) 409-3238 cell

90% of Risk Management is knowing where to place the decimal point...any consultant can give you the other 10%â„ 

This message is from pH2. This message and any attachments may contain legally privileged or confidential information, and are intended only for the individual or entity identified above as the addressee. If you are not the addressee, or if this message has been addressed to you in error, you are not authorized to read, copy, or distribute this message and any attachments, and we ask that you please delete this message and attachments (including all copies) and notify the sender by return e-mail or by phone at 317-752-6386. Delivery of this message and any attachments to any person other than the intended recipient(s) is not intended in any way to waive confidentiality or a privilege. All personal messages express views only of the sender, which are not to be attributed to pH2 and may not be copied or distributed without this statement.

-----Original Message-----
X-from: baskin-at-bio.umass.edu [mailto:baskin-at-bio.umass.edu]
Sent: Tuesday, November 07, 2006 9:55 AM
To: ph2-at-sprynet.com

Microscopists,
While Frank Karl is undoubtedly correct that the spur to
invent dark field was based on resolution and tilting beams, I wanted
to mention that there is a useful rubric for classifying types of
microscopy, and that is based on contrast. Like this:

Brightfield: Absorption contrast
Darkfield: Scattering contrast
Fluorescence: Fluorescence contrast
Phase: Optical path contrast
Nomarski: gradient in optical path contrast
Polarized light: birefringence (molecular alignment) contrast

In each case, the microscope takes advantage of a specific
kind of interaction between light and matter to generate contrast (of
course there are overlaps, eg scattering contributes to contrast in
a brightfield microscope, etc).

(The Nomarski one may be hard to understand, this kind of
optics gives rise to a signal whenever the gradient in optical path
in a local region is different than what the gradient is in the
background).

Hope this helps,
Tobias



}
}
} What an interesting question.
}
} A Dark field scope produces an image of brightly illuminated objects
} on a dark background. It was one of the earliest attempts to increase
} the resolution and detectability of objects.
}
} Abbe's theory of resolution states that for good resolution you need to
} capture two of three possible rays. This is assuming that each
} microscopic object acts as a diffraction grating. This isn't too bad
} of an assumption. The three rays are one direct, undeviated ray from
} the sample and two primary diffracted rays. (We like to think of these
} thought experiment and ray diagrams has two dimensional drawing on a
} sheet of paper). For some subjects the diffracted rays fall outside of
} the light accepting ability of the objective and these objects can not
} be resolved. (Bummer!)
}
} One approach is to tilt or move the condense off center (Many of the
} old medical grade scopes had this ability). This allows the undeviated
} ray and one diffracted ray to enter the front lens of the objective.
} This produces a dark background and white illuminated subjects.
}
} A second approach is to use a central stop in the condenser to block
} the central ray and allow only highly angled rays to illuminated the
} subject. The diffracted rays from these angled light rays form the
} image.
}
} You often need a powerful light source or work in a very dark room with
} dark adapted eyes because you are throwing away a lot of light with a
} central stop. Special condensers were, and I believe, are still made
} to efficiently produce darkfield illumination.
}
} Newer illuminating systems (like phase contrast) have replaced a lot of
} darkfield work. Still some incredible images can be formed with
} darkfield. One easy short cut is to use a phase contrast scope and
} select a condenser phase ring larger than the ring in your objective.
}
} Best wishes...........
}
} Frank Karl
} Degussa Coproration
}
}
}
}
}
}
} pavi_micro-at-yahoo.
} com To:
} frank.karl-at-degussa.com
}
} cc:
} 11/07/2006 08:12 Subject:
} [Microscopy] AskAMicroscopist: dark
} field
}
} AM
} Please respond
} to
}
} pavi_micro
}
}
}
}
}
}
}
}
}
} -----------------------------------------------------------------------
} -----
}
} The Microscopy ListServer -- CoSponsor: The Microscopy Society of
} America To Subscribe/Unsubscribe --
} http://www.microscopy.com/MicroscopyListserver


--
_ ____ __ ____
/ \ / / \ / \ \ Tobias I. Baskin
/ / / / \ \ \ Biology Department
/_ / __ /__ \ \ \__ 611 N. Pleasant St.
/ / / \ \ \ University of Massachusetts
/ / / \ \ \ Amherst, MA, 01003
/ / ___ / \ \__/ \ ____
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Voice: 413 - 545 - 1533 Fax: 413 - 545 - 3243

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From: lkrupp-at-us.ibm.com
Date: Tue, 7 Nov 2006 17:17:07 -0600
Subject: [Microscopy] Surface and Interfacial Cutting Analyis System?

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Hello-

Does anyone know anything about this techinique for gradient shaving of
thin films to expose the surface for FTIR and other analysis? I was
approched about using my microtome for this, but from what I can gather
about this machine it is much more specialized, and can measure forces
experienced by the knife during cutting. They are only interested in
exposing the face for analyis, so I am wondering what kind of knife is
used, how the alignment is done, etc. Any information would be
appreciated. The citation I have in a couple papers is for a machine by
Daipla Wintes, an SAICAS CN-20.

Thanks,
Leslie Krupp
_____________________
Leslie Krupp
IBM Almaden Research
650 Harry Road, K19/D1
San Jose, CA 95120-6099
(408) 927-3856

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From: nizets2-at-yahoo.com
Date: Wed, 8 Nov 2006 01:24:23 -0600
Subject: [Microscopy] Heat pen

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Dear colleagues,

It is not easy to find a heat pen in this small isolated country named Austria ;-).
The only one I found available is around 600 euros, which I find a LITTLE BIT expensive for such an instrument.
Someone told me that a soldering iron would do the trick, and they are available at 10 euros in every general store.
Has anyone experienced this electrician tool for EM work?
Or perhaps someone has an idea where I could find a "true" heat pen at fair price in our old continent?

Regards,

Stephane




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From: nizets2-at-yahoo.com
Date: Wed, 8 Nov 2006 02:00:41 -0600
Subject: [Microscopy] (Microscopy) Low contrast

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Hi,

Recently I tried successfully the following post-fixation:

3mls h2O
1ml 4% OsO4
0.03grams KFECN (329.26)

I warmly recommend it to any TEM microscopist. It is very easy to prepare and can only improve your image.
I really improved my membrane staining, and I think it could improve the staining of glycogen too, but I need more time to appreciate that point.

Regards,

Stephane


----- Original Message ----
X-from: "hyi-at-emory.edu" {hyi-at-emory.edu}
To: nizets2-at-yahoo.com
Sent: Monday, November 6, 2006 9:49:54 PM

Dear Microscopy Researchers:

I remember someone posted a message last year asking for
help with the low contrast problem he was having on his cultured
cells. He stated, after receiving a number of replies, that he has been
using the same protocol for years and never had problem until then. I
have heard a few other people reporting the same thing to
me. Personally, I had an episode like that years ago, but then resolved
the problem by using freshly made osmium.

Right now I am experiencing the same problem again, and the
problem persisted even when I used newly ordered osmium solution (4%
aqueous solution). I also used very short dehydration time to minimize
potential lipid lose, but no visible improvement in contrast.

I still think this problem has something to do with
osmium. But I would like to see if anyone out there has any new
insight.

Thank you in advance.


Hong

Emory SOM EM



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24, 20 -- From: Stephane Nizet {nizets2-at-yahoo.com}
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From: frank.karl-at-degussa.com
Date: Wed, 8 Nov 2006 06:58:24 -0600
Subject: [Microscopy] dark field and beyond

Contents Retrieved from Microscopy Listserver Archives
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Hi Tony,
I thought about dispersion staining, but...

With darkfield we are attempting to manipulate the sample and illumination
to get the best possible combination of resolution and detectability. The
central stop (or annular) in the back focal plane of the objective helps
increase the detectability of the dispersion of light in the sample and
mounting media at the expense of resolution. All of the diffracted, image
forming rays from the sample have been captured by the front lens.
Manipulation of these image forming rays in the back focal plan can
increase detectability, add color, make for powerful striking images, but I
suspect no further improvement in resolution is possible. I've looked at a
lot of chrysotile (as I sure you have) and I've detected very small
amounts, but I have never seen an increase in resolution in dispersion
staining darkfield or annular stop as compared to good kohler illumination.

Best wishes.....Frank


PS: good luck with the article!!!






ph2-at-sprynet.com
To: frank.karl-at-degussa.com
11/07/2006 03:59 cc:
PM Subject: [Microscopy] RE: dark field and beyond
Please respond to
ph2








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A few more Comments on Darkfield - but I like the contrast comparison.

1. Part I - Darkfield history

Darkfield has been around a long time (1800s), including paraboloid and
ellipsoid condenser uses.

Classically done with a stop in the condenser or with a reflecting
objective.

But can be done with a stop on the objective, at the light source, or
another focal plane before the eye.

Modifications of this are:

A) with dispersion staining [promoted by Crossman as well as Brown and
McCrone in the 1960s, but actually first described by Dodge in Am. Min. in
1948]

or

B) critical darkfield (you can look up an article by Ted Clarke in
Microscopy Today on critical Darkfield which comes from: Havics & Clarke:
“Critical Darkfield and Its Application to Asbestos Analysis” presented
at Inter/Micro-2002, June 24-27, 2002, Chicago, IL.; there are some nice
diagrams of the process of light interaction)

2. Part II - Contrast Issues

Phase

I(x’) proportional to [1 - (2*(phase dif)(x’)) ]
I = intensity
Thus linear with phase change (RI*thickness)
useful for up to 1/2 wavelength
Best at {1/10 wavelength

Darkfield

I(x’) proportional to (phase dif)^2 (ingoring secondary terms)
Thus not so linear with phase change
And useful for outlines or very small particles/differences

Hoffman Modulation Contrast

dI = If*(Phase dif)*(TB - TG)*2cos(theta/w)
TB = transmittance in bright area
TG = transmittance in gray area
W = width of slit
Theta = angle from perpedicular to slit
Thus non-linear but smoothed

Normaski DIC

I proportional to d(dif phase)/dx (simplified)
useful from } 1/10 wavelength
Up to 1 wavelength
best above 1/2 wavelength

[Source for above: Havics: “Asbestos Fiber Counting by Different
Optical Contrast Techniques”, presented at Inter/Micro-2003, July 7-10,
2003, Chicago, IL.; I'm trying to get an article out on this in the next 3
months or so which is why it's at my fingertips]

3. Part III additional Comments

Resolution of Darkfield} Hoffman} Phase } DIC } Brightfield based on my
tests using a resolution test slide (HSE/NPL test slide). Fluorescence is
too media dependent to make a broad statement but does better than Hoffman
using fluorescent spheres and about the same as darkfield.

Resolution does not necessarily mean detectability. Contrast is better for
detectability of an object whereas resolution is better for defining the
structure once detected.

A Dark background in general increases detectability vs a bright
background.

Tony



..........................................................................
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-----Original Message-----
X-from: baskin-at-bio.umass.edu [mailto:baskin-at-bio.umass.edu]
Sent: Tuesday, November 07, 2006 9:55 AM
To: ph2-at-sprynet.com


Microscopists,
While Frank Karl is undoubtedly correct that the spur to
invent dark field was based on resolution and tilting beams, I wanted
to mention that there is a useful rubric for classifying types of
microscopy, and that is based on contrast. Like this:

Brightfield: Absorption contrast
Darkfield: Scattering contrast
Fluorescence: Fluorescence contrast
Phase: Optical path contrast
Nomarski: gradient in optical path contrast
Polarized light: birefringence (molecular alignment) contrast

In each case, the microscope takes advantage of a specific
kind of interaction between light and matter to generate contrast (of
course there are overlaps, eg scattering contributes to contrast in
a brightfield microscope, etc).

(The Nomarski one may be hard to understand, this kind of
optics gives rise to a signal whenever the gradient in optical path
in a local region is different than what the gradient is in the
background).

Hope this helps,
Tobias



}
}
} What an interesting question.
}
} A Dark field scope produces an image of brightly illuminated objects
} on a dark background. It was one of the earliest attempts to increase
} the resolution and detectability of objects.
}
} Abbe's theory of resolution states that for good resolution you need to
} capture two of three possible rays. This is assuming that each
} microscopic object acts as a diffraction grating. This isn't too bad
} of an assumption. The three rays are one direct, undeviated ray from
} the sample and two primary diffracted rays. (We like to think of these
} thought experiment and ray diagrams has two dimensional drawing on a
} sheet of paper). For some subjects the diffracted rays fall outside of
} the light accepting ability of the objective and these objects can not
} be resolved. (Bummer!)
}
} One approach is to tilt or move the condense off center (Many of the
} old medical grade scopes had this ability). This allows the undeviated
} ray and one diffracted ray to enter the front lens of the objective.
} This produces a dark background and white illuminated subjects.
}
} A second approach is to use a central stop in the condenser to block
} the central ray and allow only highly angled rays to illuminated the
} subject. The diffracted rays from these angled light rays form the
} image.
}
} You often need a powerful light source or work in a very dark room with
} dark adapted eyes because you are throwing away a lot of light with a
} central stop. Special condensers were, and I believe, are still made
} to efficiently produce darkfield illumination.
}
} Newer illuminating systems (like phase contrast) have replaced a lot of
} darkfield work. Still some incredible images can be formed with
} darkfield. One easy short cut is to use a phase contrast scope and
} select a condenser phase ring larger than the ring in your objective.
}
} Best wishes...........
}
} Frank Karl
} Degussa Coproration
}
}
}
}
}

}
} pavi_micro-at-yahoo.

} com To:
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} cc:

} 11/07/2006 08:12 Subject:
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} field
}
} AM

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} pavi_micro

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From: CTodd2-at-dow.com
Date: Wed, 8 Nov 2006 08:43:46 -0600
Subject: [Microscopy] backscatter electron detectors

Contents Retrieved from Microscopy Listserver Archives
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(1) Does anyone have information about third-party backscatter electron detectors suitable for scanning Auger microprobes (compatible with ultra high vacuum)?

(2) Does anyone have an opinion about using an electron backscatter diffraction detector as the only backscatter electron detector in a microscope?

Clifford Todd
The Dow Chemical Co.
CTodd2-at-dow.com


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From: mlevin-at-forsyth.org
Date: Wed, 8 Nov 2006 08:59:23 -0600
Subject: [Microscopy] viaWWW: need recommendations for embedding medium

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Email: mlevin-at-forsyth.org
Name: Michael Levin

Organization: Forsyth Institute

Title-Subject: [Filtered] need recommendations for embedding medium

Question: Hello all -

I am a developmental biologisy and need a recommendation, to help me choose the right embedding medium. First and simplest, does anyone have a replacement for JB4 that is less toxic? I need something that is transparent (so that I can orient my embryos during embedding), and that I will cut with a vibratome later to make 20 micron sections. I currently use JB4 to section embryos after wholemount immunohistochemistry or in situ hybridization but I need something that is less toxic.
Second, I'm looking for a different medium that meets the following criteria. I need to be able to embed soft tissues (frog and chick embryos) for sectioning via vibratome (10 microns to 60 microns thick). Unlike with the JB4, I want to do immunohistochemistry on these sections after cutting (but do not need electron microscopy). The embedding medium also needs to be

1) non-toxic (so that a fume hood is not needed during embedding)
2) solidifies into a block that can be cut with vibratome, but not so hard that I can't trim it later with a razor blade
3) is transparent, so that I can orient embryos while embedding

Can anyone suggest any kind of embedding mix that matches this description? Please email me at mlevin-at-forsyth.org. Thank you in advance!

Mike


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From: bclarke-at-agarscientific.com
Date: Wed, 8 Nov 2006 09:00:33 -0600
Subject: [Microscopy] viaWWW: Job opportunity -Technical Support Specialist

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Email: bclarke-at-agarscientific.com
Name: Bill Clarke

Organization: Agar Scientific Ltd

Title-Subject: [Filtered] Job opportunity

Question:
Technical Support Specialist

Agar Scientific is a leading international supplier of consumables, accessories and specialist equipment for all disciplines of microscopy.

The company has a high level of expertise with wide practical experience in specimen preparation and microscopy techniques.

Based in the UK, the primary role is to provide technical support across our diverse product range to our customers and distributors. The successful applicant will also be working closely with our sales and marketing team to develop new business and product lines. Some UK and international travel may be required.

This is a new appointment and the position offers an ideal opportunity for continued development in a small successful company.

Applicants should be of graduate level (or equivalent) in a science or technology related subject and have experience in electron and optical microscopy techniques. They should have a good 'hands on' approach, be confident in front of customers and have good IT and communication skills. The position would suit a scientist or technician who wishes to build on their existing skills in a commercial environment.

Please apply offline to Dr. Lynne Joyce ljoyce-at-agarscientific.com


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From: nizets2-at-yahoo.com
Date: Wed, 8 Nov 2006 09:03:25 -0600
Subject: [Microscopy] Heat pen

Contents Retrieved from Microscopy Listserver Archives
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Hi,

Actually I already contacted the german distributor (I am in Autria, not Australia - too bad for me ;-)) and they told me that this material was for 110 volts only. Why the Homo sapiens cannot find a worldwide consensus on the current frequency is out of my capacity of comprehension but it is a fact I have to live with. Apparently I have no other choice than to order a portable heat pen and a kit of rechargeable batteries.
Thanks to all for the replies and don't hesitate to add more remarks.

Regards,

Stephane



----- Original Message ----
X-from: "Clarkson, Donna R Contr USAMRD/MCMR-UWB-L" {Donna.Clarkson-at-BROOKS.AF.MIL}
To: nizets2-at-yahoo.com
Sent: Wednesday, November 8, 2006 3:39:00 PM

Dear colleagues,

It is not easy to find a heat pen in this small isolated country named
Austria ;-).
The only one I found available is around 600 euros, which I find a
LITTLE BIT expensive for such an instrument.
Someone told me that a soldering iron would do the trick, and they are
available at 10 euros in every general store.
Has anyone experienced this electrician tool for EM work?
Or perhaps someone has an idea where I could find a "true" heat pen at
fair price in our old continent?

Regards,

Stephane




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From: beaurega-at-westol.com
Date: Wed, 8 Nov 2006 10:03:59 -0600
Subject: [Microscopy] Re: Heat pen

Contents Retrieved from Microscopy Listserver Archives
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Stephane,

EMS in NJ sells a battery powered (wax) heat pen that is fairly cheap and
works with thin sections or for wax sealing of boats. Go to
http://www.emsdiasum.com. Search for heat pen.
Catalog number 72679 $28 USD.
Replacement tips: 72679-RT.

One could hook up a 3 volt DC power supply to replace the two AA batteries.
I decided not to do that because I got "free" batteries from a storeroom
supply and I wanted it to remain portable. It will eat up batteries fast,
if used continuously or often.

I had one of those expensive ones with a big filament wire but I used this
heat pen because it had a sharp pointed tip. It was small enough for
heating thin sections in a diamond knife boat while looking at them through
a microtome microscope. EMS shows a photograph of it on their web page.

HTH,

Paul

At 01:25 AM 11/8/06 -0600, you wrote:
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From: phillipst-at-missouri.edu
Date: Wed, 8 Nov 2006 10:11:14 -0600
Subject: [Microscopy] Heat pen

Contents Retrieved from Microscopy Listserver Archives
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EMS sells many fine products including this one but as an owner of this
battery powered pen and a 115 V heat pen from Ted Pella, I find there is no
comparison for the purpose of expanding sections. the 115 V pen is
significantly better (and significantly more expensive). For wax sealing,
the battery pen may be sufficient but I use nail polish so can't directly
address that.


At 10:05 AM 11/08/06, you wrote:



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From: ph2-at-sprynet.com
Date: Wed, 8 Nov 2006 10:11:34 -0600
Subject: [Microscopy] dark field and beyond

Contents Retrieved from Microscopy Listserver Archives
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The use of a central stop in the objective will decrease resolution.

The use of a stop either in the condenser or at the light source (strong light source) allows better resolution (I've tested this; Dodge also mentions a bit of this in 1948). Ted asked me to publish an article on our paper but after looking at numerous articles over the years, I thought it was rehashing history unless I apply it in more detail to sometime relevant (asbestos or pharmaceutical contaminants). Perhaps I'll finish it off in another year or two.

I believe the improvement is because if the high NA at the critical point, combined with uniformity of background (contrast to phase chnges).

Tony

..........................................................................
Andrew Anthony "Tony" Havics, CHMM, CIH, PE
pH2, LLC
PO Box 34140
Indianapolis, IN 46234
(317) 752-6386
(317) 409-3238 cell

90% of Risk Management is knowing where to place the decimal point...any consultant can give you the other 10%â„ 

This message is from pH2. This message and any attachments may contain legally privileged or confidential information, and are intended only for the individual or entity identified above as the addressee. If you are not the addressee, or if this message has been addressed to you in error, you are not authorized to read, copy, or distribute this message and any attachments, and we ask that you please delete this message and attachments (including all copies) and notify the sender by return e-mail or by phone at 317-752-6386. Delivery of this message and any attachments to any person other than the intended recipient(s) is not intended in any way to waive confidentiality or a privilege. All personal messages express views only of the sender, which are not to be attributed to pH2 and may not be copied or distributed without this statement.

-----Original Message-----
X-from: frank.karl-at-degussa.com [mailto:frank.karl-at-degussa.com]
Sent: Wednesday, November 08, 2006 6:58 AM
To: ph2-at-sprynet.com; microscopy-at-msa.microscopy.com


A few more Comments on Darkfield - but I like the contrast comparison.

1. Part I - Darkfield history

Darkfield has been around a long time (1800s), including paraboloid and ellipsoid condenser uses.

Classically done with a stop in the condenser or with a reflecting objective.

But can be done with a stop on the objective, at the light source, or another focal plane before the eye.

Modifications of this are:

A) with dispersion staining [promoted by Crossman as well as Brown and McCrone in the 1960s, but actually first described by Dodge in Am. Min. in 1948]

or

B) critical darkfield (you can look up an article by Ted Clarke in Microscopy Today on critical Darkfield which comes from: Havics & Clarke: “Critical Darkfield and Its Application to Asbestos Analysis” presented at Inter/Micro-2002, June 24-27, 2002, Chicago, IL.; there are some nice diagrams of the process of light interaction)

2. Part II - Contrast Issues

Phase

I(x’) proportional to [1 - (2*(phase dif)(x’)) ]
I = intensity
Thus linear with phase change (RI*thickness)
useful for up to 1/2 wavelength
Best at {1/10 wavelength

Darkfield

I(x’) proportional to (phase dif)^2 (ingoring secondary terms) Thus not so linear with phase change And useful for outlines or very small particles/differences

Hoffman Modulation Contrast

dI = If*(Phase dif)*(TB - TG)*2cos(theta/w)
TB = transmittance in bright area
TG = transmittance in gray area
W = width of slit
Theta = angle from perpedicular to slit
Thus non-linear but smoothed

Normaski DIC

I proportional to d(dif phase)/dx (simplified)
useful from } 1/10 wavelength
Up to 1 wavelength
best above 1/2 wavelength

[Source for above: Havics: “Asbestos Fiber Counting by Different Optical Contrast Techniques”, presented at Inter/Micro-2003, July 7-10, 2003, Chicago, IL.; I'm trying to get an article out on this in the next 3 months or so which is why it's at my fingertips]

3. Part III additional Comments

Resolution of Darkfield} Hoffman} Phase } DIC } Brightfield based on my tests using a resolution test slide (HSE/NPL test slide). Fluorescence is too media dependent to make a broad statement but does better than Hoffman using fluorescent spheres and about the same as darkfield.

Resolution does not necessarily mean detectability. Contrast is better for detectability of an object whereas resolution is better for defining the structure once detected.

A Dark background in general increases detectability vs a bright background.

Tony



..........................................................................
Andrew Anthony "Tony" Havics, CHMM, CIH, PE
pH2, LLC
PO Box 34140
Indianapolis, IN 46234
(317) 752-6386
(317) 409-3238 cell

90% of Risk Management is knowing where to place the decimal point...any consultant can give you the other 10%â„

This message is from pH2. This message and any attachments may contain legally privileged or confidential information, and are intended only for the individual or entity identified above as the addressee. If you are not the addressee, or if this message has been addressed to you in error, you are not authorized to read, copy, or distribute this message and any attachments, and we ask that you please delete this message and attachments (including all copies) and notify the sender by return e-mail or by phone at 317-752-6386. Delivery of this message and any attachments to any person other than the intended recipient(s) is not intended in any way to waive confidentiality or a privilege. All personal messages express views only of the sender, which are not to be attributed to pH2 and may not be copied or distributed without this statement.

-----Original Message-----
X-from: baskin-at-bio.umass.edu [mailto:baskin-at-bio.umass.edu]
Sent: Tuesday, November 07, 2006 9:55 AM
To: ph2-at-sprynet.com


Microscopists,
While Frank Karl is undoubtedly correct that the spur to invent dark field was based on resolution and tilting beams, I wanted to mention that there is a useful rubric for classifying types of microscopy, and that is based on contrast. Like this:

Brightfield: Absorption contrast
Darkfield: Scattering contrast
Fluorescence: Fluorescence contrast
Phase: Optical path contrast
Nomarski: gradient in optical path contrast
Polarized light: birefringence (molecular alignment) contrast

In each case, the microscope takes advantage of a specific kind of interaction between light and matter to generate contrast (of course there are overlaps, eg scattering contributes to contrast in a brightfield microscope, etc).

(The Nomarski one may be hard to understand, this kind of optics gives rise to a signal whenever the gradient in optical path in a local region is different than what the gradient is in the background).

Hope this helps,
Tobias



}
}
} What an interesting question.
}
} A Dark field scope produces an image of brightly illuminated objects
} on a dark background. It was one of the earliest attempts to increase
} the resolution and detectability of objects.
}
} Abbe's theory of resolution states that for good resolution you need to
} capture two of three possible rays. This is assuming that each
} microscopic object acts as a diffraction grating. This isn't too bad
} of an assumption. The three rays are one direct, undeviated ray from
} the sample and two primary diffracted rays. (We like to think of these
} thought experiment and ray diagrams has two dimensional drawing on a
} sheet of paper). For some subjects the diffracted rays fall outside of
} the light accepting ability of the objective and these objects can not
} be resolved. (Bummer!)
}
} One approach is to tilt or move the condense off center (Many of the
} old medical grade scopes had this ability). This allows the undeviated
} ray and one diffracted ray to enter the front lens of the objective.
} This produces a dark background and white illuminated subjects.
}
} A second approach is to use a central stop in the condenser to block
} the central ray and allow only highly angled rays to illuminated the
} subject. The diffracted rays from these angled light rays form the
} image.
}
} You often need a powerful light source or work in a very dark room with
} dark adapted eyes because you are throwing away a lot of light with a
} central stop. Special condensers were, and I believe, are still made
} to efficiently produce darkfield illumination.
}
} Newer illuminating systems (like phase contrast) have replaced a lot of
} darkfield work. Still some incredible images can be formed with
} darkfield. One easy short cut is to use a phase contrast scope and
} select a condenser phase ring larger than the ring in your objective.
}
} Best wishes...........
}
} Frank Karl
} Degussa Coproration
}
}
}
}
}

}
} pavi_micro-at-yahoo.

} com To:
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} cc:

} 11/07/2006 08:12 Subject:
} [Microscopy] AskAMicroscopist: dark
} field
}
} AM

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From: gary-at-gaugler.com
Date: Wed, 8 Nov 2006 10:45:30 -0600
Subject: [Microscopy] Re: backscatter electron detectors

Contents Retrieved from Microscopy Listserver Archives
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(1) KE and Robinson make scintillator BSD units. The key
I think for ultra high vacuum is the use of bellows rather
than O-ring seals. Robinson makes this. Not sure about KE.
The other option is a solid state BSD which just needs a
feed through port for the diode signal wires. But performance
is not as good as with scintillator units.

(2) Do you mean EBSD? If so, then the answer is no. EBSD
is totally different from BSD. BSD is elemental contrast
while EBSD is crystal lattice info. However, using EDS
together with EBSD can produce very useful results for
multi-phase specimens, if applicable. Note that EBSD does
not work on amorphous specimens or areas.

gary g.


At 06:45 AM 11/8/2006, you wrote:



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From: a.d.mckinnon-at-abdn.ac.uk
Date: Wed, 8 Nov 2006 11:38:32 -0600
Subject: [Microscopy] Re: viaWWW: need recommendations for embedding

Contents Retrieved from Microscopy Listserver Archives
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Hi Mike,

I don't have a suggestion for a less toxic replacement for JB4 but agar may
do the trick for your second embedding proposition. You could try embedding
in 3% low gel point agar which liquifies fairly quickly in a waterbath at
60'C, stays liquid to about 35'C and is quite solid at RT.
If necesary (and if it doesn't compromise your subsequent procedures), you
can probably get better support / better sections by immersing in fixative
(aldehyde or ethanol) to make the gel more solid.

Hope this helps,

Alastair
At 09:06 08/11/2006 -0600, you wrote:



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Alastair McKinnon
Histology & EM Facility Manager
University of Aberdeen, Institute of Medical Science
Foresterhill, Aberdeen, AB25 2ZD
tel: +44(0) 1224 552923 (office); +44(0) 1224 555911 (lab)
fax: +44(0) 1224 559533; email: a.d.mckinnon-at-abdn.ac.uk
www.abdn.ac.uk/ims/h-em



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From: gary-at-gaugler.com
Date: Wed, 8 Nov 2006 11:58:58 -0600
Subject: [Microscopy] Heat pen

Contents Retrieved from Microscopy Listserver Archives
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Look around for a conversion transformer. These convert between
120 and 240 and vice versa. You would need a unit that would
handle the VA or Watts or Amps that the pen requires.

I got one of these at our US Radio Shack store to convert 120
to 240 for an Olympus PM-10AD photo controller. It cost about
$24US.

gary g.


At 07:06 AM 11/8/2006, you wrote:



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From: n.l.m.barlow-at-dur.ac.uk
Date: Wed, 8 Nov 2006 12:02:36 -0600
Subject: [Microscopy] viaWWW: Help with settings for Canon EOS D60 on Leica DM LB2

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Email: n.l.m.barlow-at-dur.ac.uk
Name: Natasha Barlow

Organization: Durham University

Title-Subject: [Filtered] Help with settings for Canon EOS D60 on Leica DM LB2

Question: I was wondering if someone would be able to help me sort out the settings for a microscope-camera set up I am trying to use to take images of diatoms.

The set up we have is a Leica DM LB2 High Powered Light Microscope with a Leica C Plan 100x1.25 Oil Magnifying Lens. On top is attachment EF-bayonet Leica HC 1.6x for Canon D-SLR Camera. We then have a Canon EOS D60 camera ontop (its quite an old one as the digital out is not USB!). We have been using the camera on AV as suggested in the bayonet instructions. However, what ever changes we make we cant seam to get the quality of image one would expect.

Does anyone have any ideas of what is needing too be changed?

Many thanks

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From: NWWhite-at-bwxt.com
Date: Wed, 8 Nov 2006 14:54:22 -0600
Subject: [Microscopy] backscatter electron detectors

Contents Retrieved from Microscopy Listserver Archives
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Hello Clifford,

My BSE system was made by a third party manufacturer, GW Electronics.
GW disbanded and was sold to:
http://www.kedev.co.uk/

I have not yet purchased anything from these folks, but perhaps they
could help...

Woody White
BWXT Services




-----Original Message-----
X-from: CTodd2-at-dow.com [mailto:CTodd2-at-dow.com]
Sent: Wednesday, November 08, 2006 9:44 AM
To: White, Woody N.

(1) Does anyone have information about third-party backscatter electron
detectors suitable for scanning Auger microprobes (compatible with ultra
high vacuum)?

(2) Does anyone have an opinion about using an electron backscatter
diffraction detector as the only backscatter electron detector in a
microscope?

Clifford Todd
The Dow Chemical Co.
CTodd2-at-dow.com


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From: stravisi-at-uniud.it
Date: Thu, 9 Nov 2006 05:03:24 -0600
Subject: [Microscopy] Re: Help with settings for Canon EOS D60 on Leica DM LB2

Contents Retrieved from Microscopy Listserver Archives
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Mike
A company called London Resin produce a series of acrylic resins
including LR White. The resin is suitable for LM sections up to 15-20um
or em sections, can be used in a lot of immuno labelling. It is
transparent and has low toxicity (you may need to check if that's lower
than JB4).

In the UK it is marketed by Agar Scientific Ltd, 66a Cambridge Road,
Stansted, Essex, CM24 8DA, UK (Tel 0279 813519). But I'm sure that there
will be a US outlet (if that's where you are).

The downside is:
1. it may be more expensive than JB4
2. it needs to be polymerised in the absence of air (oxygen). For e.m we
use gelatine capsules filled up and a coverslip or lid on each one to
exclude air.
3. it is recommended that thinner sections are cut on glass Ralph
knives, but thick ones may not need this (I don't know).

I hope this helps.

Malcolm

Malcolm Haswell
e.m. unit
School of Health, Natural and Social Sciences
Fleming Building
University of Sunderland
Tyne & Wear
SR1 3SD
UK
e-mail: malcolm.haswell-at-sunderland.ac.uk

----- Original Message -----
X-from: mlevin-at-forsyth.org




I know that it could seem very little professional... but I get really good
pictures just positioning the digital camera on the ocular of the
microscope. You just need a good screen on the camera to control focusing
and maybe take more than one picture and choose later the best. I bypassed
all problems on attachment and bayonets... I insert measure scale in
pictures with ImageJ from a picture of a graduated slide.
I am dealing mostly with mammal hair samples, but I tried just for fun with
other kind of samples with the same good results

bye!

antonella
______________________________________
Antonella Stravisi
Dipartimento di Scienze Animali
Universitŕ di Udine
via S. Mauro, 2
33010 Pagnacco (UD)
Italy



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From: dfine-at-seton.org
Date: Thu, 9 Nov 2006 07:56:47 -0600
Subject: [Microscopy] AskAMicroscopist: Leica EMPT

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Email: dfine-at-seton.org
Name: Diann Fine

Organization: Brackenridge Hospital

Education: Graduate College

Location: Austin, Texas, USA

Title: Leica EMPT

Question: I would appreciate some information from the EM labs using the Leica EMTP. Is it user-friendly and reliable? Would you purchase it again? Were there any problems or issues with it? Do you run 2 different processing programs together at the same time? Do you run separate procedures for kidney and muscle biopsies? Are different procedures run for each different tissue?
Thanks for the replies.

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From: mkelly-at-fs.fed.us
Date: Thu, 9 Nov 2006 08:05:58 -0600
Subject: [Microscopy] viaWWW: LRWhite

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Email: mkelly-at-fs.fed.us
Name: M

Organization: USDA

Title-Subject: [Filtered] LRWhite

Question: I have been using LR White resin for immunolabeling. I have problems with contrast in my samples. Sometimes several sections will be too poor a contrast to get pictures and sometimes part of a section will be just adequate contrast. I understand too long an infiltration time can give you contrast problems. I've cut this down but can only cut it back so far as my material is difficult to get embeded.I would sure appreciate any ideas .
Thanks, M

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From: cgarber-at-2spi.com
Date: Thu, 9 Nov 2006 08:56:21 -0600
Subject: [Microscopy] BSE and EBSD detectors

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Clifford Todd wrote:
===============================================
(1) Does anyone have information about third-party backscatter electron
detectors suitable for scanning Auger microprobes (compatible with ultra
high vacuum)?

(2) Does anyone have an opinion about using an electron backscatter
diffraction detector as the only backscatter electron detector in a
microscope?

=========================================
To answer the questions:

(1) The Robinson detector is not bakeable, but has been installed and
successfully operated in microscopes with chamber vacuums in the vicinity
of
10exp-8 torr. I am unaware of other BSE detectors that will operate at
lower
pressures. The detector is retractable and if you wish to have a bellows
retraction
mechanism, that is also available. See URL
http://www.2spi.com/catalog/instruments/robinson-backscattered-electron-BSE-detector.shtml
for further information.

(2) As has been pointed out, EBSD requires a different detector from
a BSE detector. But I believe one could operate them simultaneously by
the appropriate choice of detectors - a BSE detector above the specimen
and an EBSD to one side of the specimen.

Disclaimer: SPI Supplies is the North American distributor for the line
of Robinson BSE detectors so we are not exactly a disinterested third
party.

Chuck

===================================================
Charles A. Garber, Ph. D. Ph: 1-(610)-436-5400
President
SPI SUPPLIES FAX: 1-(610)-436-5755
PO BOX 656 e-mail: cgarber-at-2spi.com
West Chester, PA 19381-0656 USA Cust. Service: spi2spi-at-2spi.com


Look for us!
############################
WWW: http://www.2spi.com
############################
==================================================


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From: Rosemary.White-at-csiro.au
Date: Thu, 9 Nov 2006 15:12:50 -0600
Subject: [Microscopy] Re: viaWWW: LRWhite

Contents Retrieved from Microscopy Listserver Archives
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One way to add contrast without affecting antigenicity too much is to add
~0.2-2% tannic acid to fix or freeze-sub solvent, followed by a similar
concentration of ferric chloride (rather than OsO4). How strong a
concentration you use and for how long varies quite a bit with tissue, and
I've only ever processed plant tissues - which often need reasonably long (2
days to a few weeks) infiltrations.
I've also played around with the U acetate stain - 2% UA in 70% ethanol for
not too long (2-5 min) worked reasonably well on thickish (dark gold)
sections of medium grade LRWhite.

good luck,


Rosemary White rosemary.white-at-csiro.au
CSIRO Plant Industry ph. 61 (0)2-6246 5475
GPO Box 1600 mob. 61 (0)402 835 973
Canberra, ACT 2601 fax. 61 (0)2-6246 5334
Australia

} From: mkelly-at-fs.fed.us
} Reply-To: mkelly-at-fs.fed.us
} Date: Thu, 9 Nov 2006 08:07:39 -0600
} To: rosemary.white-at-csiro.au
} Subject: [Microscopy] viaWWW: LRWhite
}
}
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} Email: mkelly-at-fs.fed.us
} Name: M
}
} Organization: USDA
}
} Title-Subject: [Filtered] LRWhite
}
} Question: I have been using LR White resin for immunolabeling. I have problems
} with contrast in my samples. Sometimes several sections will be too poor a
} contrast to get pictures and sometimes part of a section will be just adequate
} contrast. I understand too long an infiltration time can give you contrast
} problems. I've cut this down but can only cut it back so far as my material is
} difficult to get embeded.I would sure appreciate any ideas .
} Thanks, M
}
} ---------------------------------------------------------------------------
}
} ==============================Original Headers==============================
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From: mkelly-at-fs.fed.us
Date: Thu, 9 Nov 2006 15:20:16 -0600
Subject: [Microscopy] viaWWW: LR White

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Email: mkelly-at-fs.fed.us
Name: mkelly

Organization: USDA

Title-Subject: [Filtered] LR White

Question: In my earlier post I left out that I am using a TEM for my imunolabeling work.
Thanks again for any help anyone can give.

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From: martini-at-accurel.com
Date: Thu, 9 Nov 2006 15:21:14 -0600
Subject: [Microscopy] viaWWW: DualBeam Operator job

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Email: martini-at-accurel.com
Name: Martin Izquierdo

Organization: Accurel

Title-Subject: [Filtered] DualBeam Operator job

Question: Accurel Systems is currently looking for experienced Dual Beam operators.
Accurel is located in Sunnyvale, CA

TEM sample prep using dualbeam FIB is a plus.

Please send resumes to
Helenl-at-accurel.com

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From: swtkeller-at-yahoo.com
Date: Thu, 9 Nov 2006 15:21:51 -0600
Subject: [Microscopy] viaWWW: TEM-Looking for a general shallow junction etch recipe

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Email: swtkeller-at-yahoo.com
Name: Sandra Keller

Organization: TEM Lab

Title-Subject: [Filtered] TEM-Looking for a general shallow junction etch recipe for silicon

Question: Hi All:
I am looking for a general shallow junction etch/stain recipe and procedure for use with silicon for use in TEM shallow junction delineation. Thanks for being such an important resource.
Sandra Keller
TEM Lab

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From: gary-at-gaugler.com
Date: Thu, 9 Nov 2006 15:53:13 -0600
Subject: [Microscopy] Re: BSE and EBSD detectors

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Chuck:

How is temperature an issue in scanning Auger microprobes.
I'm not familiar with these. If heat is an issue, then
I agree that heat is not good for scintillator detectors
since the detector tip is basically plastic. However, the
current Robinsons are metal coated. But I doubt it is
sufficient for very hot environments.

BSD for EBSD basically does not work. The killer is the
high tilt angle (70 degrees) of the specimen. What does
work is fitting the EBSD camera phosphor screen with a
Forward Scatter Detector (FSD). The FSD works just like
a BSD but at the high tilt. With properly prepared
specimens, FSD images are like 3-D. Very good for estimating
ROI and step size.

gary g.



At 06:58 AM 11/9/2006, you wrote:



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11, 20 -- From: Gary Gaugler {gary-at-gaugler.com}
11, 20 -- Subject: Re: [Microscopy] BSE and EBSD detectors
11, 20 -- Cc: MSA listserver {microscopy-at-microscopy.com}
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From: cgarber-at-2spi.com
Date: Fri, 10 Nov 2006 00:43:08 -0600
Subject: [Microscopy] BSE and EBSD detectors

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Gary Gaugler wrote:
================================================
} Chuck:
}
} How is temperature an issue in scanning Auger microprobes.
} I'm not familiar with these. If heat is an issue, then
} I agree that heat is not good for scintillator detectors
} since the detector tip is basically plastic. However, the
} current Robinsons are metal coated. But I doubt it is
} sufficient for very hot environments.
}
} BSD for EBSD basically does not work. The killer is the
} high tilt angle (70 degrees) of the specimen. What does
} work is fitting the EBSD camera phosphor screen with a
} Forward Scatter Detector (FSD). The FSD works just like
} a BSD but at the high tilt. With properly prepared
} specimens, FSD images are like 3-D. Very good for estimating
} ROI and step size.
==================================================
It has been my understanding that temperature can at times be important in
an Auger system because the energy of Auger electrons is low and the Auger
electrons come from very close to the surface, perhaps the top nm or so. If
the surface is contaminated with a gas, or some other surface-sorbed
species, the Auger electrons, which are related to the material composition
of the surface, would only generate a signal from the contamination layer,
not the material underneath that it was intended to study. The conventinal
wisdom is that UHV and bake out assure low contamination at the surface to
be analyzed.

Auger electrons also have a typical energy of 1 - 2 kV and as such are best
excited by lower energy electron beams, usually less than 5 kV, and
a BSE detector that responds well to low kV electrons is required for BSE
imaging at those voltages.

None of the Robinson designed detectors, including the latest versions is
good for heating and bakeout. I am reasonably certain this would be the
case for any other BSE detector but of course, I could be wrong about that.
For the Robinson BSE detectors, the maximum temperature they will withstand
is slightly under 50 C.

I presume Dr. Robinson might be following this conversation and perhaps he
can explain this better.

Disclaimer: My firm, SPI Supplies is the North American distributor for the
Robinson BSE detector product line so we are not a disinterested third
party.

Chuck

===================================================
Charles A. Garber, Ph. D. Ph: 1-(610)-436-5400
President
SPI SUPPLIES FAX: 1-(610)-436-5755
PO BOX 656 e-mail: cgarber-at-2spi.com
West Chester, PA 19381-0656 USA Cust. Service: spi2spi-at-2spi.com


Look for us!
############################
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############################
==================================================



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From: richard.beanland-at-bookham.com
Date: Fri, 10 Nov 2006 03:19:09 -0600
Subject: [Microscopy] viaWWW: TEM-Looking for a general shallow junction

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Hi Sandra,
As far as I'm aware, the only junction delineation stain that
has been used successfully for TEM work is 0.5% HF in Nitric. This has
been a well- established technique for looking at junctions in Si for
years. A fairly recent example for shallow junctions is given in Yoo et
al., Appl. Phys. Letts. 80, 2687 (2002).
You do have to take some precautions to get a good result. For
example, if your sample is mounted on a Cu grid, you have to protect
this from the nitric acid by coating it with lacquer or something
similar. I seem to remember Ron Anderson telling me he used to cool the
etchant well below room temperature to slow the etch rate down and make
it easier to control.
HF is a particularly nasty acid, so if you have no experience of it
make sure you are properly trained in its use before you start.

Good luck!

Richard



________________________________________
Richard Beanland
Materials Analysis
Bookham
Caswell
Towcester
Northants
NN12 8EQ
United Kingdom
Tel. +44 1327 356362
Fax. +44 1327 356775
http://www.bookham.com
________________________________________


-----Original Message-----
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To: Richard Beanland

This Question/Comment was submitted to the Microscopy Listserver
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Email: swtkeller-at-yahoo.com
Name: Sandra Keller

Organization: TEM Lab

Title-Subject: [Filtered] TEM-Looking for a general shallow junction
etch recipe for silicon

Question: Hi All:
I am looking for a general shallow junction etch/stain recipe and
procedure for use with silicon for use in TEM shallow junction
delineation. Thanks for being such an important resource.
Sandra Keller
TEM Lab

------------------------------------------------------------------------
---

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From: richard.beanland-at-bookham.com
Date: Fri, 10 Nov 2006 06:50:26 -0600
Subject: [Microscopy] Failure analysis;flip-chip dies

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Hi folks,
I have a failure analysis job looking at a flip-chip Si die that
has failed. It's been a (long) while since I did failure analysis
looking at silicon chips and printed circuit boards.. What strategies
are used to get a solder-bump chip off the board for further
investigation? Various ploys using a soldering iron and tweezers come
to mind but it would be nice to know how the experts do it, if you're
willing to share the knowledge.

Many thanks

Richard



________________________________________
Richard Beanland
Materials Analysis
Bookham
Caswell
Towcester
Northants
NN12 8EQ
United Kingdom
Tel. +44 1327 356362
Fax. +44 1327 356775
http://www.bookham.com
________________________________________



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From: jae5-at-lehigh.edu
Date: Fri, 10 Nov 2006 07:47:51 -0600
Subject: [Microscopy] Crystallographic indices

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

I would like to know the tricks for getting Word to write a number with
a bar over it (as is used in crystallographic indices). I believe that
this has been the subject of past posts and I have tried to find them in
the archive but perhaps I am not using the right search terms. My
apologies for bringing it up again.

I have had a solution that has served me well for a decade, but now I
have a situation where it does not work. I recall that several
solutions were proposed and I would like to try another. Help please.

If you are interested, what I have been doing until now is to create the
symbol (eg bar-one) with the equation editor and then making an
"autotext" entry to insert it.

Thanks,
Alwyn
--
...........
Alwyn Eades
Department of Materials Science and Engineering
Lehigh University
5 East Packer Avenue
Bethlehem
Pennsylvania 18015-3195
Phone 610 758 4231
Fax 610 758 4244
jae5-at-lehigh.edu


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From: ptomic-at-ciclonsemi.com
Date: Fri, 10 Nov 2006 07:58:53 -0600
Subject: [Microscopy] viaWWW: Failure analysis;flip-chip dies

Contents Retrieved from Microscopy Listserver Archives
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Email: ptomic-at-ciclonsemi.com
Name: Peter Tomic

Organization: Ciclon Semiconductor Device Corp

Title-Subject: [Filtered] Failure analysis;flip-chip dies

Question: Richard,

A possible solution to this problem is a hot air stream system. If you know the solder composition, e.g. Pb-Sn or Pb-free, you can adjust the air temperature to accomodate. You're likely to fracture the device if you use a conventional soldering iron.

I have one other suggestion as an analysis tool prior to P.C. board removal. If the substrate is not too heavily doped, you may use NIR [Near Infra-Red] microscopy to image the device from the backside. Of course this is provided no NIR opaque materials are present. I'm assuming the device you are working with is Si, but NIR also works well for GaAs.

Regards,

Peter Tomic
Ciclon Semiconductor Device Corp.


Hi folks,
I have a failure analysis job looking at a flip-chip Si die that has failed. It's been a (long) while since I did failure analysis looking at silicon chips and printed circuit boards.. What strategies are used to get a solder-bump chip off the board for further investigation? Various ploys using a soldering iron and tweezers come to mind but it would be nice to know how the experts do it, if you're willing to share the knowledge.

Many thanks

Richard



________________________________________
Richard Beanland
Materials Analysis
Bookham
Caswell
Towcester
Northants
NN12 8EQ
United Kingdom
Tel. +44 1327 356362


---------------------------------------------------------------------------

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From: dljones-at-bestweb.net
Date: Fri, 10 Nov 2006 08:33:49 -0600
Subject: [Microscopy] Re: BSE and EBSD detectors

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Alwyn,
One possible solution is to install in Windows a special crystallography
fonts (crystallography.ttf) available at: http://x-seed.net/freestuff.html.
I hope this helps,
Leszek

Leszek Kepinski
Division of Nanomaterials Chemistry and Catalysis
Institute of Low Temperature and Structure Research,
Polish Academy of Sciences,
P.O. Box 1410,
50-950 Wroclaw, Poland
e-mail: L.Kepinski-at-int.pan.wroc.pl


----- Original Message -----
X-from: {jae5-at-lehigh.edu}
To: {L.Kepinski-at-int.pan.wroc.pl}
Sent: Friday, November 10, 2006 2:50 PM

Alwyn,
Word allows you to overwrite two characters in the same position by using
one of the field code functions. To make "bar-1" you should:

(1) press ctrl-F9 (this will automatically insert two curly brackets { } in
which you can type the field-code instruction;
(2) inside the curly brackets type EQ \o(1,Ż) - you may need to play around
to find the "overbar" symbol. On my system I can find this using
Insert:Symbol (it is called the "Macron"). Alternatively you can try
alt+0175 (using the number keypad).
(3) press alt-F9 to display the text (you may need to do this twice). You
can toggle between the field-code and the text using Alt-F9.

I seem to remember reading somewhere that for some language settings (where
the decimal separator is defined as the comma?) you may need to use a
semi-colon instead of a comma to separate the two characters (i.e. (1;Ż)).

Hope this helps,

Andy Godfrey.

--------------------------------------------------
Andy Godfrey,
Dept. Materials Science and Engineering,
Tsinghua University,
Beijing, 100084,
P.R. China,
(86) 010-6279-0755 (home)
(86) 010-6278 8317(office)
-------------------------------------------------

----- Original Message -----
X-from: {jae5-at-lehigh.edu}
To: {awgodfrey-at-mail.tsinghua.edu.cn}
Sent: Friday, November 10, 2006 9:50 PM

Chuck,

I just would like to throw in a small clarification on AES as the posts
seem to be a little unclears as far as heat usage.

In order to achieve UHV levels of vacuum, the systems have to be baked in
order to get all the surfaces clean enough to get to that vacuum level. If
you wanted a BSE detector in one of these, I would imagine it would have
to be baked also, I don't see a way around that. However, the ability for
the detector to withstand temperature, would be not when it's powered up
but rather without any power to it. I don't know if this makes any
difference with BSE detectors, but I thought it should be pointed out.

UHV is needed in AES so that the surfaces being analyzed are not
contaminated by the gas molecules from the vacuum itself. In UHV, the time
to form a monolayer of atoms deposited on the surface is a direct function
of the level of vacuum acheived. Since AES is a surface analysis
technique, meaning the signal is generated from the top 2 or 3 atomic
layers (IIRC), it is imperative to be able to keep the surface clean
during analysis.

How to achieve a "clean" surface for AES analysis can be complicated,
however, I have not seen heating to be a normally used method except in
special cases.

The BSE detctor would not have to be able to withstand heat while
operating, only while idle and with no power to it.

dj


On Fri, 10 Nov 2006, cgarber-at-2spi.com wrote:

} It has been my understanding that temperature can at times be important in
} an Auger system because the energy of Auger electrons is low and the Auger
} electrons come from very close to the surface, perhaps the top nm or so. If
} the surface is contaminated with a gas, or some other surface-sorbed
} species, the Auger electrons, which are related to the material composition
} of the surface, would only generate a signal from the contamination layer,
} not the material underneath that it was intended to study. The conventinal
} wisdom is that UHV and bake out assure low contamination at the surface to
} be analyzed.
}
} Auger electrons also have a typical energy of 1 - 2 kV and as such are best
} excited by lower energy electron beams, usually less than 5 kV, and
} a BSE detector that responds well to low kV electrons is required for BSE
} imaging at those voltages.
}
} None of the Robinson designed detectors, including the latest versions is
} good for heating and bakeout. I am reasonably certain this would be the
} case for any other BSE detector but of course, I could be wrong about that.
} For the Robinson BSE detectors, the maximum temperature they will withstand
} is slightly under 50 C.
}
} I presume Dr. Robinson might be following this conversation and perhaps he
} can explain this better.
}
} Disclaimer: My firm, SPI Supplies is the North American distributor for the
} Robinson BSE detector product line so we are not a disinterested third
} party.
}
} Chuck
}
} ===================================================
} Charles A. Garber, Ph. D. Ph: 1-(610)-436-5400
} President
} SPI SUPPLIES FAX: 1-(610)-436-5755
} PO BOX 656 e-mail: cgarber-at-2spi.com
} West Chester, PA 19381-0656 USA Cust. Service: spi2spi-at-2spi.com
}
}
} Look for us!
} ############################
} WWW: http://www.2spi.com
} ############################
} ==================================================
}
}
}
} ==============================Original Headers==============================
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From: antoniomiguel.garcia-at-gmail.com
Date: Fri, 10 Nov 2006 08:35:01 -0600
Subject: [Microscopy] AskAMicroscopist:Phase contrast vs Dark Field

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Hello

Could someone please explain the difference between phase contrast and dark
field microcopy? What optic effects one get with one or the other? I see Frank
Karl states in his very nice explanation of dark field sent to the list the
following: "One easy short cut is to use a phase contrast scope and select
a condenser phase ring larger than the ring in your objective". Can
Phase contrast
be transformed into darkfield then?

Thank you for any explanation

Antonio M Garcia

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From: baskin-at-bio.umass.edu
Date: Fri, 10 Nov 2006 08:53:26 -0600
Subject: [Microscopy] Re: AskAMicroscopist:Phase contrast vs Dark Field

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Antonio,
Darkfield allows you to detect objects by virtue of their
ability to scatter light. Scattering is weak so you have to "get rid"
of the non-scattered, incident light. The way you do this is to have
the light incident at an angle that is too wide for the lens to
gather. Imagine a hollow cone of light coming up through the
condenser that is at an angle too wide for the NA of the objective.
This hollow cone of light converges on the specimen and carries on
past the objective. If the specimen is empty then looking down the
tubes you see darkness. That is where darkfield gets its name. But if
you have some scatterers, you will see light from them against the
dark background, and the more they scatter the brighter they will be.
Darkfield is great for picking up dust and debris, among other
things. That's the concept. Now, how do you get a hollow cone of
light? Well you can see that the diffculty depends on the NA. The
higher the NA of your objective the trickier the condenser design
needs to be to achive an angle greater than the objective NA. So if
you have a modest to low power objective, then a quick and easy way
to get such a hollow cone is to use a phase ring designed for a high
NA lens. Phase rings exactly provide hollow cones of light and by
using a phase ring designed for a high NA objective (ie wide light
cone) with a low power objective, the hollow cone of incident light
passes that objective by and you get darkfield. Obviously, this
approach won't work if you want to do darkfield with a high NA lens,
and for that you need a specially designed darkfield condensor.

Now, phase contrast allows you do detect objects by virtue of
their optical thickness, which changes the phase of the light passing
through them compared to light that does not pass through them. The
tricky bit is to convert that into something your eye can see. This
is done also with a hollow cone of light but in this case the cone is
gathered by the objective and in the rear focal plane of the lens is
placed a ring that lines up with the cone. The ring in the obj rear
focal plane changes the phase of this incident light, relative any
light that goes elsewhere through the rear focal plane of the
objective. That is ultimately how the phase difference between light
that goes through the sample (and hence elsewhere in the rear focal
plane) and the background (light through the phase ring) is detected.

The optics behind phase contrast are much trickier to grasp
intuitively, indeed Zernicke won a Nobel prize for inventing it,
whereas darkfield has been played with for ages.

hope this helps,
Tobias


}
}
} Hello
}
} Could someone please explain the difference between phase contrast and dark
} field microcopy? What optic effects one get with one or the other? I see Frank
} Karl states in his very nice explanation of dark field sent to the list the
} following: "One easy short cut is to use a phase contrast scope and select
} a condenser phase ring larger than the ring in your objective". Can
} Phase contrast
} be transformed into darkfield then?
}
} Thank you for any explanation
}
} Antonio M Garcia
}

--
_ ____ __ ____
/ \ / / \ / \ \ Tobias I. Baskin
/ / / / \ \ \ Biology Department
/_ / __ /__ \ \ \__ 611 N. Pleasant St.
/ / / \ \ \ University of Massachusetts
/ / / \ \ \ Amherst, MA, 01003
/ / ___ / \ \__/ \ ____
http://www.bio.umass.edu/biology/baskin/
Voice: 413 - 545 - 1533 Fax: 413 - 545 - 3243

==============================Original Headers==============================
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From: frank.karl-at-degussa.com
Date: Fri, 10 Nov 2006 08:59:10 -0600
Subject: [Microscopy] Re: AskAMicroscopist:Phase contrast vs Dark Field

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

At the risk of creating another bump and run...
Phase contrast and dark field are different. Phase contrast converts phase
differences between the object of interest and the surrounding material to
amplitude difference which is what the human eye is sensitive to. One
could think of darkfield as a way of increase detectability.

Using a large phase ring in the condenser is a trick. Just a short cut to
get illuminated objects on a dark background.

I refer you to Tobias's excellent explanation.




antoniomiguel.garci
a-at-gmail.com To: frank.karl-at-degussa.com
cc:
11/10/2006 08:35 AM Subject: [Microscopy] AskAMicroscopist:Phase contrast vs Dark Field
Please respond to
antoniomiguel.garci
a








----------------------------------------------------------------------------

The Microscopy ListServer -- CoSponsor: The Microscopy Society of America


Hello

Could someone please explain the difference between phase contrast and dark
field microcopy? What optic effects one get with one or the other? I see
Frank
Karl states in his very nice explanation of dark field sent to the list the
following: "One easy short cut is to use a phase contrast scope and select
a condenser phase ring larger than the ring in your objective". Can
Phase contrast
be transformed into darkfield then?

Thank you for any explanation

Antonio M Garcia

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From: TindallR-at-missouri.edu
Date: Fri, 10 Nov 2006 09:03:59 -0600
Subject: [Microscopy] Knifebreaker question

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Dear Listers,

We have two LKB 7801A knifebreakers which I have been able to bring back
up to full functionality, with the help of a lot of useful replies to a
fairly recent posting of mine on this listserver. But I have one last
question.

When you take the top off the machine, you can see the four heavy screws
which hold the breaking head onto its heavy metal base (I'm not talking
guitars here). But there are two other, lighter allen-head screws that
appear to be there to adjust the height of the breaking head off the
metal base when the four heavier screws are tightened down. Is that
actually what they are for? Is this to adjust the amount of pressure
necessary to break glass?

Thanks for any hints. This is fix-everything-broken week in our lab....

Cheers,
Randy

Randy Tindall
Senior EM Specialist
Electron Microscopy Core Facility---We Do Small Well!
W125 Veterinary Medicine
University of Missouri
Columbia, MO 65211
Tel: (573) 882-8304
Fax: (573) 884-2227
Email: tindallr-at-missouri.edu
Web: http://www.emc.missouri.edu
On-line calendar:
http://biotech.rnet.missouri.edu/cgi-bin/Calcium310.pl?Op=Splash&Amount=
Week&NavType=Both&Type=TimePlan


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From: TindallR-at-missouri.edu
Date: Fri, 10 Nov 2006 10:13:13 -0600
Subject: [Microscopy] TEM: Anti-rhodopsin ab

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Me again.

Can anybody recommend a good primary antibody against rhodopsin in mice
and/or dog retina? Preferably one that has been tested for EM
immunogold labeling? My perusal of the online catalogs hasn't been very
helpful so far.

Thanks much.

Randy

Randy Tindall
Senior EM Specialist
Electron Microscopy Core Facility---We Do Small Well!
W125 Veterinary Medicine
University of Missouri
Columbia, MO 65211
Tel: (573) 882-8304
Fax: (573) 884-2227
Email: tindallr-at-missouri.edu
Web: http://www.emc.missouri.edu
On-line calendar:
http://biotech.rnet.missouri.edu/cgi-bin/Calcium310.pl?Op=Splash&Amount=
Week&NavType=Both&Type=TimePlan


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From: milesd-at-us.ibm.com
Date: Fri, 10 Nov 2006 10:59:05 -0600
Subject: [Microscopy] Re: Failure analysis;flip-chip dies

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Hi Richard,

It would depend a great deal on the type of failure mode, or mechanism, you
suspect. I have used a hot air heat gun to melt the solder balls and taped
the part off the board. I have carefully cut away most of the circuit
board, and then ground away the circuit board directly under the module,
which would still be attached by the solder balls. I have also used single
edge razor blades, or knife blades. Do you plan on powering up the module
(or chip), and testing it, after you get it off the board, or is this
strictly a physical failure analysis?

The sample prep must not alter/affect the failure, or the clues that are
going help solve the puzzle. Heat can be a problem, as well as the water
drip while grinding away the circuit board (may need to be done dry, which
is difficult with ceramic substrates).

I hope this helps. If there are more specific questions, I will try to
help. My 20+ years in FA has been varied, and quite interesting.

Darrell

richard.beanland-at-bookham.com wrote on 11/10/2006 07:51:52 AM:

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} Hi folks,
} I have a failure analysis job looking at a flip-chip Si die that
} has failed. It's been a (long) while since I did failure analysis
} looking at silicon chips and printed circuit boards.. What strategies
} are used to get a solder-bump chip off the board for further
} investigation? Various ploys using a soldering iron and tweezers come
} to mind but it would be nice to know how the experts do it, if you're
} willing to share the knowledge.
}
} Many thanks
}
} Richard
}
}
}
} ________________________________________
} Richard Beanland
} Materials Analysis
} Bookham
} Caswell
} Towcester
} Northants
} NN12 8EQ
} United Kingdom
} Tel. +44 1327 356362
} Fax. +44 1327 356775
} http://www.bookham.com
} ________________________________________
}
}
}
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From: NWWhite-at-bwxt.com
Date: Fri, 10 Nov 2006 12:10:20 -0600
Subject: [Microscopy] Failure analysis;flip-chip dies

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Although I have not tried it myself, the appropriate (high temp) hot air
gun and tweezers are supposed to do the job.


Woody White
BWXT Services


-----Original Message-----
X-from: richard.beanland-at-bookham.com [mailto:richard.beanland-at-bookham.com]

Sent: Friday, November 10, 2006 7:52 AM
To: White, Woody N.

Hi folks,
I have a failure analysis job looking at a flip-chip Si die that
has failed. It's been a (long) while since I did failure analysis
looking at silicon chips and printed circuit boards.. What strategies
are used to get a solder-bump chip off the board for further
investigation? Various ploys using a soldering iron and tweezers come
to mind but it would be nice to know how the experts do it, if you're
willing to share the knowledge.

Many thanks

Richard



________________________________________
Richard Beanland
Materials Analysis
Bookham
Caswell
Towcester
Northants
NN12 8EQ
United Kingdom
Tel. +44 1327 356362
Fax. +44 1327 356775
http://www.bookham.com
________________________________________



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From: john.mardinly-at-intel.com
Date: Fri, 10 Nov 2006 12:24:09 -0600
Subject: [Microscopy] Failure analysis;flip-chip dies

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Richard;
A lot depends on the exact method of manufacturing of the flip
chip part. Every manufacturer does something a little different and then
patents their method. Epoxy under fills are popular for taking thermally
induced stresses away from the solder bumps. In that case, no amount of
hot anything will get the part off. All analysis must be done from the
back side. If this sounds difficult, it is. There are a lot of backside
thinning techniques that have been developed to address this difficulty.
They consume extensive resources but they do work. However, many are
proprietary, and cannot be revealed on this forum.

John Mardinly
Intel

This is the opinion of the author and does not necessarily represent the
opinion of Intel Corp.

-----Original Message-----
X-from: richard.beanland-at-bookham.com [mailto:richard.beanland-at-bookham.com]

Sent: Friday, November 10, 2006 4:51 AM
To: Mardinly, John

Hi folks,
I have a failure analysis job looking at a flip-chip Si die that
has failed. It's been a (long) while since I did failure analysis
looking at silicon chips and printed circuit boards.. What strategies
are used to get a solder-bump chip off the board for further
investigation? Various ploys using a soldering iron and tweezers come
to mind but it would be nice to know how the experts do it, if you're
willing to share the knowledge.

Many thanks

Richard



________________________________________
Richard Beanland
Materials Analysis
Bookham
Caswell
Towcester
Northants
NN12 8EQ
United Kingdom
Tel. +44 1327 356362
Fax. +44 1327 356775
http://www.bookham.com
________________________________________



=======================================================================
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From: gary-at-gaugler.com
Date: Fri, 10 Nov 2006 12:50:38 -0600
Subject: [Microscopy] Re: Failure analysis;flip-chip dies

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html


This can be (and usually is) a tricky proposition.
It would help knowing a few details about your situation
before plunging in to strategies.

First off, why do you need to do failure analysis on this IC?
This is not meant to sound flippant. If you are really
having to do FA on this IC, depending on its complexity,
it can be a huge job and even bigger if you are not set up
to do this sort of work on a more routine basis. Even
so, different types of ICs tend to need different methods
of FA. Based on un-installed identical ICs, what type of
metal interconnects are used (Al or Cu), how many layers, ILD type
and what method of planarization? Is this flip chip
on a supporting substrate or flipped directly onto the
main PCB? Is there any conformal coating on the board/IC?

What part number is the IC? This will tell what kind of
base package it is--plastic or ceramic and the node size
of the IC and if it is Pb-free or not. What kind of PCB
is the part on? Is it multi-layer FR4 or ? What is the
requirement for retaining the main PCB--i.e., can it be
destroyed? Once removed from the main PCB, are you going
to re-bump the package and do electrical testing? This
would be a first look step to test the IC. The problem
with this is that depending on the construction of the
whole part, the die and/or package could be destroyed
such that the whole thing would no longer work electrically.

gary g.


At 04:53 AM 11/10/2006, you wrote:



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From: ptomic-at-ciclonsemi.com
Date: Fri, 10 Nov 2006 17:43:54 -0600
Subject: [Microscopy] viaWWW: Etch Recipes - Junction Staining

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Email: ptomic-at-ciclonsemi.com
Name: Peter Tomic

Organization: Ciclon Semiconductor Device Corp

Title-Subject: [Filtered] Etch Recipes - Junction Staining

Question: Sandra et al,

Please see the following paper by Dr. Charles W. Pearce, "Defect Delineation and Junction Staining Techniques for Silicon Using Wet Chemistry", AT&T, Allentown, PA presented at the Electrochemical Society, October 1991. The author is just a few doors down from me right now so I can get you questions answered from the source, if need be.

The paper outlines and provides recipes for Sirtl, Secco, Wright-Jenkins, Yang's Etch, Schimmel, Seiter, Dash, Sato and Memc.


Hi Sandra,
As far as I'm aware, the only junction delineation stain that has been used successfully for TEM work is 0.5% HF in Nitric. This has been a well- established technique for looking at junctions in Si for years. A fairly recent example for shallow junctions is given in Yoo et al., Appl. Phys. Letts. 80, 2687 (2002).
You do have to take some precautions to get a good result. For example, if your sample is mounted on a Cu grid, you have to protect this from the nitric acid by coating it with lacquer or something similar. I seem to remember Ron Anderson telling me he used to cool the etchant well below room temperature to slow the etch rate down and make it easier to control.
HF is a particularly nasty acid, so if you have no experience of it make sure you are properly trained in its use before you start.

Good luck!

Richard


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From: ph2-at-sprynet.com
Date: Sat, 11 Nov 2006 13:37:10 -0600
Subject: [Microscopy] Re: AskAMicroscopist:Phase contrast vs Dark Field

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I'll add another perspective on their descriptions:

Dark Field:

The cone of light that goes through the sample coming out of the condenser is more like a thin annulus. Think of it as a party hat (thin outer rim coming to a point). It is at a very high angle (outside the field of view). The angle that exits the sample layer is too high to be captured by the objective. Think of a party hat on top of another party hat point-to-point. The brim of the top party hat (that should get captured by the objective) is too big. Thus, when no sample is in the light path, the field of view is dark (dakfield). Small specs or the edges of samples (high change in phase) scatter the light so that it changes angle of the rays at that point and does get captured by the objective. One then sees white edges or spots (where this occurs in the sample) over a darkfield (where there is no scattering).

Phase Contrast:

In the most common use, the cone of light that goes through the sample coming out of the condenser is a broad annulus. Think of it as a party hat made out of very thick cardboard (outer rim coming to a point). It is at a moderate angle (inside the field of view). As the light passes through the specimen there are a) rays that are normally seen and do not touch any of the specimen and b) there are some that go through the specimen. The ones that go through the specimen are retarded (many biological specimens retard by 1/4 of a wavelength of light or within a wavelength range). As they come back through the objective, some encounter a dark (quasi opaque) annulus in the back focal plane that matches the optical size of the annulus of light from the condenser. This is called a phase ring. The phase ring set-up is of the correct thickness to either retard the rays by 1/4 of a wavelngth (positive phase contrast) or to advance them (negative phase contrast). The rays going through the specimen are then doubly retarded - hopefully many by 1/4 plus 1/4 = 1/2 wavelength, while other rays are not. When they recombine, those rays that are 1/2 wavelength in difference (out of phase) cancel each other producing darkness. Those that are in phase combine to be bright. This dark (black) vs bright differences provide contrast - hence phase contrast. The actual retardation (phase shift) is dependent upon thickness and refractive indices.

(For positive phase contrast) because many rays do not get their phase shifted, the background is bright with objects or edges dark. For negative phase contrast, the background is dark and the objects are light.

Let's take a phase annulus for phase contrast setup. Let's presume it was designed for an objective of higher numerical aperature (say NA = 0.85 for a 100X obj). If we use an 40X objective with an NA of 0.65, the only the light scattered from the specimen will reach the objective. This will create a darkfield effect. It will not be the optimum though - only the proper sizing will do that.

Another comment, because phase differences are related to thickness, one can see artificial repetitive lines (series or halos) from where thicknesses create phase shifts of 1/4 wavelength plus 1 wavelength, 1/4 wavelength plus 2 wavelengths, 1/4 wavelength plus 3 wavelengths, 1/4 wavelength plus 4 wavelengths, etc. One will also see some effects from 2nd and 3rd harmonics of the main constructive/destructive inference.

And one more comment, because of the phase shifting aspects enhancing edge effects, one can increase detection of Becke line for refractive index matching of isotropic materials (glasses for instances in forensic applications). [This can also be improved with Nomarski DIC under similar principles to an order mag better than typical brightfield]

Tony

..........................................................................
Andrew Anthony "Tony" Havics, CHMM, CIH, PE
pH2, LLC
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90% of Risk Management is knowing where to place the decimal point...any consultant can give you the other 10%â„ 

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-----Original Message-----
X-from: frank.karl-at-degussa.com [mailto:frank.karl-at-degussa.com]
Sent: Friday, November 10, 2006 9:04 AM
To: ph2-at-sprynet.com

At the risk of creating another bump and run...
Phase contrast and dark field are different. Phase contrast converts phase differences between the object of interest and the surrounding material to amplitude difference which is what the human eye is sensitive to. One could think of darkfield as a way of increase detectability.

Using a large phase ring in the condenser is a trick. Just a short cut to get illuminated objects on a dark background.

I refer you to Tobias's excellent explanation.




antoniomiguel.garci
a-at-gmail.com To: frank.karl-at-degussa.com
cc:
11/10/2006 08:35 AM Subject: [Microscopy] AskAMicroscopist:Phase contrast vs Dark Field
Please respond to
antoniomiguel.garci
a








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Hello

Could someone please explain the difference between phase contrast and dark field microcopy? What optic effects one get with one or the other? I see Frank Karl states in his very nice explanation of dark field sent to the list the
following: "One easy short cut is to use a phase contrast scope and select a condenser phase ring larger than the ring in your objective". Can Phase contrast be transformed into darkfield then?

Thank you for any explanation

Antonio M Garcia

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From: fahayes-at-ucdavis.edu
Date: Sun, 12 Nov 2006 12:14:46 -0600
Subject: [Microscopy] viaWWW: CM12 alignment procedures

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Email: fahayes-at-ucdavis.edu
Name: Fred Hayes

Organization: Univ of CA at Davis

Title-Subject: [Filtered] CM12 alignment procedures

Question: Does anyone out there have an alignment procedure for the
CM12 they can forward either as pdf or word doc?

Thank you

Fred Hayes
Univ of CA Davis
Chem Engineering and Mat Sci
0108 Kemper
Davis, CA
530-752-0284
fahayes-at-ucdavis.edu

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From: murphyjudy-at-comcast.net
Date: Sun, 12 Nov 2006 12:38:18 -0600
Subject: [Microscopy] Re: viaWWW: CM12 alignment procedures

Contents Retrieved from Microscopy Listserver Archives
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Hi Fred,
Off line I am sending you the instructions I wrote for a CM12 TEM.
Good luck,
Judy Murphy
microscopyproducts
Stockton, CA



fahayes-at-ucdavis.edu wrote:

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From: r.sims-at-auckland.ac.nz
Date: Sun, 12 Nov 2006 19:47:12 -0600
Subject: [Microscopy] Microscopy Conference in New Zealand

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February 5 to 9, 2007

see

http://www.microscopy2007.org.nz/


see you there


cheers

rtch

--
Ritchie Sims Ph D Phone : 64 9
3737599 ext 87713
Microanalyst Fax : 64 9 3737435
Department of Geology email :
r.sims-at-auckland.ac.nz
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From: richard.beanland-at-bookham.com
Date: Mon, 13 Nov 2006 04:42:30 -0600
Subject: [Microscopy] Re: Failure analysis;flip-chip dies

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Just to give some clarification on this - the chip in question is a Si
ASIC, I guess, mounted on a multilayer board which drives a laser, which
sends light down an optical fibre; the board slots into a telecoms
module. In fact you can see the board at
http://www.bookham.com/common/trans_tunable.cfm, or
http://www.bookham.com/documents/datasheets_trans/TL5000.pdf. No idea at
the moment what the chip does, whether it's bipolar or CMOS, Al or Cu
metallisation etc. etc.. There are 8 lead-free solder bumps and there
doesn't appear to be any epoxy underfill; the board is expendable.
Usually I work on the optoelectronic components produced at the fab
here, more recently the miniature optical bench that surrounds it inside
a 'gold box', but as we move more into systems rather than just
components, things are getting more varied. The failure analysis
request at the moment is just "we know this chip has stopped working,
what's wrong with it?". I don't think we have the kit here to test the
chip's functionality off the board, so if there's nothing obvious like a
cracked solder bump or an obvious electrical overstress event I guess it
will get pushed back to the PCB supplier.

Some very useful suggestions which I like the sound of: Infra-red
through the back of the chip, thanks to Peter Tomic, since this is
non-destructive and simple for me to do. Also fuming nitric/sulphuric
to get rid of the PCB, thanks Valery Ray. I've already done real-time
radiography to look for cracks in the solder and SEM looking around the
edges. And perhaps even more important than any technique, knowing some
of the right questions to ask about the chip which will make it a lot
easier to get a meaningful result.

Thanks to all for a great response to my question,

Richard





________________________________________
Richard Beanland
Materials Analysis
Bookham
Caswell
Towcester
Northants
NN12 8EQ
United Kingdom
Tel. +44 1327 356362
Fax. +44 1327 356775
http://www.bookham.com
________________________________________


-----Original Message-----
X-from: gary-at-gaugler.com [mailto:gary-at-gaugler.com]
Sent: 10 November 2006 18:52
To: Richard Beanland


This can be (and usually is) a tricky proposition.
It would help knowing a few details about your situation
before plunging in to strategies.

First off, why do you need to do failure analysis on this IC?
This is not meant to sound flippant. If you are really
having to do FA on this IC, depending on its complexity,
it can be a huge job and even bigger if you are not set up
to do this sort of work on a more routine basis. Even
so, different types of ICs tend to need different methods
of FA. Based on un-installed identical ICs, what type of
metal interconnects are used (Al or Cu), how many layers, ILD type
and what method of planarization? Is this flip chip
on a supporting substrate or flipped directly onto the
main PCB? Is there any conformal coating on the board/IC?

What part number is the IC? This will tell what kind of
base package it is--plastic or ceramic and the node size
of the IC and if it is Pb-free or not. What kind of PCB
is the part on? Is it multi-layer FR4 or ? What is the
requirement for retaining the main PCB--i.e., can it be
destroyed? Once removed from the main PCB, are you going
to re-bump the package and do electrical testing? This
would be a first look step to test the IC. The problem
with this is that depending on the construction of the
whole part, the die and/or package could be destroyed
such that the whole thing would no longer work electrically.

gary g.


At 04:53 AM 11/10/2006, you wrote:



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From: ktrou-at-nb.utmem.edu
Date: Mon, 13 Nov 2006 08:32:43 -0600
Subject: [Microscopy] Scheduling programs

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Hello everyone,

I manage a multi-user facility and are looking into on-line
scheduling programs. I'd appreciate your input as to what's out
there and your experiences.

Thanks in advance,

Kathy Troughton
Senior Research Associate
University of Tennessee, Memphis
Memphis, TN
901-448-5976
ktrou-at-nb.utmem.edu


==============================Original Headers==============================
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From: Elliott-at-arizona.edu
Date: Mon, 13 Nov 2006 10:29:13 -0600
Subject: [Microscopy] Re: Scheduling programs

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

OneCore works for us.
http://demo.arl.arizona.edu/

David


On Nov 13, 2006, at 7:36 AM, ktrou-at-nb.utmem.edu wrote:

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} Hello everyone,
}
} I manage a multi-user facility and are looking into on-line
} scheduling programs. I'd appreciate your input as to what's out
} there and your experiences.
}
} Thanks in advance,
}
} Kathy Troughton
} Senior Research Associate
} University of Tennessee, Memphis
} Memphis, TN
} 901-448-5976
} ktrou-at-nb.utmem.edu
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From: syli-at-northwestern.edu
Date: Mon, 13 Nov 2006 12:25:02 -0600
Subject: [Microscopy] Scheduling programs

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Kathy,

I have designed a dedicated software for scientific multi-user facilities
(Facility Online Manager). The detailed features of this software package is
discussed in this month's issue of Microscopy Today (November 2006). This
software has been used at Northwestern for 3+ years and has been installed
in a couple of other institutions.

Take a look here:
http://www.fom.northwestern.edu/

Please drop me email if you need demo accounts to the server.

Shuyou
_____________________________
Shuyou Li, Ph.D.
NUANCE Center
Northwestern University
2220 Campus Drive, 1161 Cook Hall
Evanston, IL 60208-3108, USA
Ph: (847) 491-6723
Fax: (847) 467-6573
Email: syli-at-northwestern.edu
http://www.nuance.northwestern.edu/



-----Original Message-----
X-from: ktrou-at-nb.utmem.edu [mailto:ktrou-at-nb.utmem.edu]
Sent: Monday, November 13, 2006 8:38 AM
To: syli-at-northwestern.edu

Hello everyone,

I manage a multi-user facility and are looking into on-line
scheduling programs. I'd appreciate your input as to what's out
there and your experiences.

Thanks in advance,

Kathy Troughton
Senior Research Associate
University of Tennessee, Memphis
Memphis, TN
901-448-5976
ktrou-at-nb.utmem.edu


==============================Original Headers==============================
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From: zhangj16-at-msu.edu
Date: Mon, 13 Nov 2006 12:29:41 -0600
Subject: [Microscopy] One problem with Ion milling

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Hi Everyone

I have a problem with PIPS (Gatan) in our lab. The samples (including
metal and semiconductors) are not milled at all (like 10 hours at
voltage 4.5). We just cleaned the penning gauge and two guns. The vacuum
and current looks common. I wonder someone can give me suggestion what
is the problem.

Thanks.

Jiaming


==============================Original Headers==============================
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From: lkrupp-at-us.ibm.com
Date: Mon, 13 Nov 2006 13:37:14 -0600
Subject: [Microscopy] TEM sample prep: no heat adhesives required

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Hello-

I need to prepare a self supporting cross section of a multilayer film on
a 1" silicon wafer. Problem is the material cannot be heated above room
temperature. So as far as I know, I need to use something other than G-1
to prepare the sandwich and something other than crystalbond to do the
polishing/dimpling. My first thought is M-bond 610 for the sandwich, I've
heard this will cure overnight at RT? And superglue for the polishing,
although this will require soaking off between switching sides. M-bond
610 is not soluble in acetone, right?

Any other ideas? Commercial responses are welcome.

The sample will be ion-milled at LN2 temperatures after the
polishing/dimpling steps.

Thanks,
Leslie
_____________________
Leslie Krupp
IBM Almaden Research
650 Harry Road, K19/D1
San Jose, CA 95120-6099
(408) 927-3856

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From: phillipst-at-missouri.edu
Date: Mon, 13 Nov 2006 14:58:32 -0600
Subject: [Microscopy] diopter adjustment

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

I understand how and why to perform the diopter adjustment on the eyepieces
of a light microscope but I must admit I don't get why this is called a
"diopter adjustment". Can someone explain this terminology to me.

Thomas E. Phillips, PhD
Professor of Biological Sciences
Director, Molecular Cytology Core
2 Tucker Hall
University of Missouri
Columbia, MO 65211-7400

573-882-4712 (office)
573-882-0123 (fax)
PhillipsT-at-missouri.edu



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From: gary-at-gaugler.com
Date: Mon, 13 Nov 2006 15:28:29 -0600
Subject: [Microscopy] Failure analysis;flip-chip dies

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

The new info helps.

Since the IC is an 8-connection IC, it is most likely
not far from a "trivial" job to analyze it. First off,
I think it is not a flip chip but rather a BGA. This
is quite a different matter and makes analysis easier.
If I am right, the die is on a lead frame and wire bonded
to an internal substrate that is then solder bumped.
Since the main board is expendable, then just cut out the
bad IC (main PCB and all). Then heat to about 125F and
cleave it off of the main PCB. I assume that the device
is small in size. the other option is to grind off the
main PCB. However, if it is assembled as I suspect, the
circuit side of the IC is up, not down.

A quick x-ray of the device will show how it is constructed.
A side x-ray will reveal the cross section detail of the
die and package. From there, the plastic encapsulation can
be removed with hot sulfuric or SF6 + O2 plasma. Alternatively,
if the die is small, a focused ion beam can selectively expose the
die. With an exposed die, reverse engineering can take place
and then analyze areas for FA.

If the device is simply not connected well to the main PCB,
then C-SAM analysis will show this.

If you are not into FA and reverse engineering, the tools to
do this vastly exceed the value of knowing why the part failed,
IMO. I suspect that if you return the module to the vendor,
they will just say that it failed and offer a replacement
module. If the failure happens frequently, I would still
revert this issue to the module maker. In all likelihood,
they designed the ASIC.

A close up pix of the device would be helpful.

gary g.





At 02:45 AM 11/13/2006, you wrote:



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From: tivol-at-caltech.edu
Date: Mon, 13 Nov 2006 16:03:39 -0600
Subject: [Microscopy] Re: diopter adjustment

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html


On Nov 13, 2006, at 12:58 PM, phillipst-at-missouri.edu wrote:

} I understand how and why to perform the diopter adjustment on the
} eyepieces
} of a light microscope but I must admit I don't get why this is called a
} "diopter adjustment". Can someone explain this terminology to me.
}
Dear Thomas,
A diopter is an inverse meter. (I think; the Handbook of Chemistry
and Physics does not have the word in its glossary.) Lens power is
measured in diopters, so the adjustment is just that power needed to
have the eye pieces focus the image onto your retina.
Yours,
Bill Tivol, PhD
EM Scientist and Manager
Cryo-Electron Microscopy Facility
Broad Center, Mail Code 114-96
California Institute of Technology
Pasadena CA 91125
(626) 395-8833
tivol-at-caltech.edu


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From: phillipst-at-missouri.edu
Date: Mon, 13 Nov 2006 16:08:54 -0600
Subject: [Microscopy] diopter adjustment

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

I understand a diopter is the inverse of the focal length in meters
(1/meter). I understand how a 2 diopter lens can combined with a 0.5
diopter lens to get a 2.5 diopter effect. but when you "focus" an eyepiece,
aren't you simply raising or lowering the height of the ocular? I don't
see how this is a diopter adjustment. Tom



At 04:04 PM 11/13/06, you wrote:



} ----------------------------------------------------------------------------
} The Microscopy ListServer -- CoSponsor: The Microscopy Society of America

Thomas E. Phillips, PhD
Professor of Biological Sciences
Director, Molecular Cytology Core
2 Tucker Hall
University of Missouri
Columbia, MO 65211-7400

573-882-4712 (office)
573-882-0123 (fax)
PhillipsT-at-missouri.edu



==============================Original Headers==============================
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From: mw275-at-cornell.edu
Date: Mon, 13 Nov 2006 16:31:41 -0600
Subject: [Microscopy] Re: One problem with Ion milling

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Hi Jianming,

I assume that you have checked, and tuned, the gun alignment with the
fluorescent screen stub and made sure your flow rates are optimised
(both of these are in the manual). Another possible one is if you are
using a one sided milling stub and both your guns are angled to come
from underneath, sounds silly but it can happen!

Matt

} Hi Everyone
}
} I have a problem with PIPS (Gatan) in our lab. The samples (including
} metal and semiconductors) are not milled at all (like 10 hours at
} voltage 4.5). We just cleaned the penning gauge and two guns. The vacuum
} and current looks common. I wonder someone can give me suggestion what
} is the problem.
}
} Thanks.
}
} Jiaming

--
Dr M.Weyland, Electron Microscopist

Monash Centre for Electron Microscopy
Monash University
Clayton Campus
VIC 3800
Australia


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From: youngwk-at-snu.ac.kr
Date: Mon, 13 Nov 2006 18:04:46 -0600
Subject: [Microscopy] TEM sample prep: no heat adhesives required

Contents Retrieved from Microscopy Listserver Archives
http://www.microscopy.com/MicroscopyListserver/MicroscopyArchives.html

Leslie,

We use DEVCON 5 minute epoxy to glue face-to-face, then use crazy bond (same
as superglue, cyanoacrylate-base) for temporary fixture.
Both gel-type or liquid type crazy bond worked fine for us. Acetone can be
used to dissolve the bond.
One word for DEVCON, it softens a little bit in Acetone, so don't put the
ground piece too long time in acetone.
M-bond will not be strong enough if it is not heated.
Some others use UV-curing bonds as permanent gluing for some optical films
and substrates.
Good luck!

Young-Woon Kim
Seoul National University
School of Materials Science and Engineering
Tel) +82-2-880-7977
Fax) +82-2-883-8197
e-mail) youngwk-at-snu.ac.kr

-----Original Message-----
X-from: lkrupp-at-us.ibm.com [mailto:lkrupp-at-us.ibm.com]
Sent: Tuesday, November 14, 2006 4:41 AM
To: youngwk-at-snu.ac.kr

Hello-

I need to prepare a self supporting cross section of a multilayer film on a
1" silicon wafer. Problem is the material cannot be heated above room
temperature. So as far as I know, I need to use something other than G-1 to
prepare the sandwich and something other than crystalbond to do the
polishing/dimpling. My first thought is M-bond 610 for the sandwich, I've
heard this will cure overnight at RT? And superglue for the polishing,
although this will require soaking off between switching sides. M-bond 610
is not soluble in acetone, right?

Any other ideas? Commercial responses are welcome.

The sample will be ion-milled at LN2 temperatures after the
polishing/dimpling steps.

Thanks,
Leslie
_____________________
Leslie Krupp
IBM Almaden Research
650 Harry Road, K19/D1
San Jose, CA 95120-6099
(408) 927-3856

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From: millerpod-at-hotmail.com
Date: Mon, 13 Nov 2006 19:10:24 -0600
Subject: [Microscopy] viaWWW: phillips xl 30 quad current amplifier PCB

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Email: millerpod-at-hotmail.com
Name: Andy Miller

Organization: Curtin Uni Western Australia

Title-Subject: [Filtered] phillips xl 30 quad current amplifier PCB

Question: Hi All

We have a problem with our Phillips XL 30.

The quad current amplifier PCB card that slots in the back was overheating and disrupts the scanning beam. We use a fan to cool it until we managed to get a replacement but that too had the same problem, which leads us to believe that it may not be a faulty card but a nearby component that is generating excess heat and in turn overheating the card.

Dose this sound feasible? Has anybody experienced this sort of problem? Could there be another reason aside from the remote chance that we got 2 dud cards?

Thanks for you time
Andy


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From: t.keller-at-uni-jena.de
Date: Mon, 13 Nov 2006 19:10:52 -0600
Subject: [Microscopy] viaWWW: Scheduling System

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Email: t.keller-at-uni-jena.de
Name: Thomas Keller

Organization: Institute of Materials Science / Friedrich-Schiller-University Jena

Title-Subject: [Filtered] Scheduling System

Question: Dear Kathy,

the Faces Scheduling System works fine:

http://faces.ccrc.uga.edu/



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From: W.Muss-at-salk.at
Date: Tue, 14 Nov 2006 05:28:25 -0600
Subject: [Microscopy] Re: diopter adjustment

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Dear Prof. Phillips,
Hi, Tom,

perhaps just some clarification (arguments are not mine.....):

Definitions for:

DIOPTER:
A measure of the optical power of a lens, equal to the reciprocal of its
focal length in meters.

DIOPTER ADJUSTER:
A mechanism in a light microscope eyepiece for adjusting the position of
the eyelens to compensate for differences in dioptric power between the
eyes of the observer(s)

DIOPTRIC:
Regarding an optical system containing refractive elements

Reference:
HEATH Julian P (Ed): Dictionary of Microscopy, (Micr.& Analysis) John WILEY
& Sons LTD, ISBN-10:0-470-01199-8 (ISBN-13: 978-0-470-01199-7), 2005 pp
357

Assuming you are talking about adjustment of the ocular(s) according to a
/your (refraction) myopy or hypermetropy:

I guess, you won't/don't adjust the } ocular's height { (by raising or
lowering the "diopter adjustment ring") but instead "realiter" change the
focal length of the ocular lens system to adapt the correct centering of
} sample/vision rays { ON your retina instead of their otherwise crossing /
centering before (myopy) or behind (metropy) the retinal cells.
==}
"Adjust the diopter to suit the observer's eyesight. The method differs
according to the eyepiece used.
Unless the diopter is adjusted, parfocality will not be maintained when the
objective is changed.
(When using e.g. WHK 10x eyepieces, the focus is adjusted with the focusing
knob[s] whil observing through the right eyepiece. The diopter adjustment
ring on the left side is then adjusted for maximum image clarity for the
left eye)......slightly different adjustment for "finder"-eyepieces (in
photomicroscopy)......"
Reference:
How to improve Photography through the Microscope, Olympus Optical Co.Ltd.
brochure (end of 1980ies; M132E-1191T)

Hope that will be an explanation to you,

best wishes,

Wolfgang MUSS
Salzburg, Austria






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Von: phillipst-at-missouri.edu[SMTP:phillipst-at-missouri.edu]
Antwort an: phillipst-at-missouri.edu
Gesendet: Montag, 13. November 2006 23:11
An: W.Muss-at-salk.at
Betreff: [Microscopy] Re: diopter adjustment

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I understand a diopter is the inverse of the focal length in meters
(1/meter). I understand how a 2 diopter lens can be combined with a 0.5
diopter lens to get a 2.5 diopter effect. but when you "focus" an eyepiece,
aren't you simply raising or lowering the height of the ocular? I don't
see how this is a diopter adjustment. Tom



At 04:04 PM 11/13/06, you wrote:



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Thomas E. Phillips, PhD
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2 Tucker Hall
University of Missouri
Columbia, MO 65211-7400

573-882-4712 (office)
573-882-0123 (fax)
PhillipsT-at-missouri.edu



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From: Sam.Murray-at-port.ac.uk
Date: Tue, 14 Nov 2006 08:20:52 -0600
Subject: [Microscopy] Temperature inside SEM chamber?

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Dear All,

I would like to use a thermoreversible gel (liquid at 4degree and under) to immobilise
a multicellular aggregate to the membrane of a Quantomix capsule. This is then
inserted in to a SEM.

Question, what is the internal temperature of a SEM?

Many thanks



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From: randerson20-at-tampabay.rr.com
Date: Tue, 14 Nov 2006 08:20:57 -0600
Subject: [Microscopy] Re: One problem with Ion milling

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Jiaming,

Either something is blocking the beams or, more likely, the beams are
not aimed properly. Either problem is easy to diagnose as you can see
the beams where they strike the sample if you darken the room. The
sample holder should fluoresce by itself or paint a little aquadag on
it. The beam aiming adjustments are discussed in the instruction book.

Ron Anderson

zhangj16-at-msu.edu wrote:
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} I have a problem with PIPS (Gatan) in our lab. The samples (including
} metal and semiconductors) are not milled at all (like 10 hours at
} voltage 4.5). We just cleaned the penning gauge and two guns. The vacuum
} and current looks common. I wonder someone can give me suggestion what
} is the problem.
}
} Thanks.
}
} Jiaming
}
}
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From: ionsourcerer-at-mac.com
Date: Tue, 14 Nov 2006 11:52:35 -0600
Subject: [Microscopy] One problem with Ion milling

Contents Retrieved from Microscopy Listserver Archives
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Hi All,

I'm just getting started with serious optical, SEM, and TEM work, but I _do_ have a bit of
experience as an ion source designer (and sufferer), of nearly thirty years. I'm not familiar
with the particular machine you are having trouble with, but it most likely uses a Kaufman
low-energy-broad-beam ion source. I use them for other things, but the most frequent
problem is that the two very delicate grids w/ all the tiny holes in them are shorted out by
what is technically called 'crud' in the world of sourcery. There is a voltage potential between
the two grids that extracts the ion plasma from within the source. It is easily diagnosed if
you look at the current meter on the power supply, and see it is shorted out. The current
draw will be essentially infinite, and the supply probably has an automatic cut-out to
protect itself. If the grids are shorted, then that portion of the supply won't turn on.
The remedy is dislodging the offending piece of 'crud' without just moving the problem
to another spot. GENTLY try blowing a bit of nitrogen, (or any dry pure gas), over the face
of the front grid into the source. If you are _extremely_ fortunate, it will dislodge the 'crud'
and give you an open circuit between the two grids. If it doesn't work on the first try,
try blowing through the grid from various angles and orientations. It is worth some
patient effort, because taking the source apart is a delicate process, and gloves should
_always_ be worn, to keep from contaminating the source with oil from fingerprints.
There are probably some tiny, delicate, and very important parts involved, so this
shouldn't be undertaken by anyone without considerable ion source experience, or
you will probably cause even greater problems.
On Tuesday, November 14, 2006, at 09:29AM, {randerson20-at-tampabay.rr.com} wrote:
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From: mager-at-interchange.ubc.ca
Date: Tue, 14 Nov 2006 13:57:28 -0600
Subject: [Microscopy] TEM sample prep: no heat adhesives required

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Dear Leslie,
When we were waiting for our M-610 to arrive, we used Devon 2-ton epoxy to
make cross-section samples. It can be squeezed thin and is stronger than
5-minute epoxy, but takes longer to harden up than 5-minute. I think we left
it overnight.
Regards,
Mary Mager
Electron Microscopist
Materials Eng. UBC
#419 - 6350 Stores Rd.
Vancouver, B.C. V6T 1Z4
CANADA
Phone: 604-822-5648
Fax: 604-822-3619
email: mager-at-interchange.ubc.ca

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Sent: Monday, November 13, 2006 11:43 AM
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Hello-

I need to prepare a self supporting cross section of a multilayer film on a
1" silicon wafer. Problem is the material cannot be heated above room
temperature. So as far as I know, I need to use something other than G-1 to
prepare the sandwich and something other than crystalbond to do the
polishing/dimpling. My first thought is M-bond 610 for the sandwich, I've
heard this will cure overnight at RT? And superglue for the polishing,
although this will require soaking off between switching sides. M-bond 610
is not soluble in acetone, right?

Any other ideas? Commercial responses are welcome.

The sample will be ion-milled at LN2 temperatures after the
polishing/dimpling steps.

Thanks,
Leslie
_____________________
Leslie Krupp
IBM Almaden Research
650 Harry Road, K19/D1
San Jose, CA 95120-6099
(408) 927-3856

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From: larry-at-celtic.freewire.co.uk
Date: Tue, 14 Nov 2006 15:04:27 -0600
Subject: [Microscopy] Re: Temperature inside SEM chamber?

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I guess you actually mean the temperature under the beam ..... The
temperature in the specimen chamber generally is going to be close to
ambient (except for an ESEM, were the sample will be ~5 deg C)

Key things to consider are probe current, scan speed, magnification
and thermal conduction path away from the imaged area. In the case of
Quantomix capsules, with a FEG-SEM it is relatively easy to punch
holes in the membrane with the beam, rather less so with W SEMs.

It is also relatively easy in most SEMs to find conditions which will
melt lower temperature thermosetting polymers, so local sample
temperatures in the 50 to 100 deg C aren't too difficult to generate,
with the right sample.

Basically, I think there are so many variables involved, you're just
going to have to try it.

Regards,
--
Larry Stoter
JEOL (UK) Ltd
tel: +44-(0)1707-377117, fax: +44-(0)1707-373254, e-mail: larrys-at-jeoluk.com

PLEASE NOTE - Agressive SPAM filtering is employed. If you don't get
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From: pbgrover-at-yahoo.com
Date: Wed, 15 Nov 2006 08:29:45 -0600
Subject: [Microscopy] viaWWW: integrity in scientific research

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Email: pbgrover-at-yahoo.com
Name: Paul Grover

Organization: Purdue University

Title-Subject: [Filtered] integrity in scientific research

Question: Dear Microscopists,

I find it difficult to understand, based on the responses, both on and =
offlist, to the thread on research ethics back in April, that no one has =
yet posted to the forum I recently set up (Yahoo group 'honestscience'). =
Could this be because of concerns over anonymity? If so, please =
contact me or someone else to find out how to post using an alias. =
Sorry to waste more listserver space, but since quite a few people said =
they would welcome such a forum, I just don't understand why there =
hasn't been any activity. Best regards to you all.

Paul Grover, Ph.D.
Owner, Grover Roofing and Remodeling
and
Chief Microscopist and Bottle Washer, Microvista Laboratory

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From: nizets2-at-yahoo.com
Date: Wed, 15 Nov 2006 08:53:49 -0600
Subject: [Microscopy] alignment with tecnai twin G20

Contents Retrieved from Microscopy Listserver Archives
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Hello all,

After a computer crash and a restart of the system, I found that the beam alignment was much worse than before.
I tried reloading previous alignment settings, but with no effect.
The main problem is that when I change the magnification, the beam shifts, especially between the mag 44kx and 55kx.
I did once the full alignment procedure, and I don't want to repeat it again (and then it is not necessary). I just need to know how to correct this specific problem, either using the direct alignment or within the alignment section.
I tried centering the beam with the multifunction knobs using direct alignment/beam shift, saving the alignment for each magnification but it does not fix the problem.
Does anyone have any idea?

Stephane




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From: garsha-at-itg.uiuc.edu
Date: Wed, 15 Nov 2006 08:59:58 -0600
Subject: [Microscopy] Re: biotinylated fluorochrome?

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Evident markets biotinylated quantum dots.

Karl Garsha
Head Applications Scientist
Roper Bioscience
3440 E. Brittania Drive
Tucson, AZ 85706
Office: 520-547-2704



phillipst-at-missouri.edu wrote:
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} I have often used streptavidin conjugated fluorochromes but now find myself
} in need of a biotin-conjugated fluorochrome (e.g., FITC, Alexa) for a
} special experiment. Does anyone know a commercial source?
}
} Thomas E. Phillips, PhD
} Professor of Biological Sciences
} Director, Molecular Cytology Core
} 2 Tucker Hall
} University of Missouri
} Columbia, MO 65211-7400
}
} 573-882-4712 (office)
} 573-882-0123 (fax)
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}
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} 5, 18 -- Subject: biotinylated fluorochrome?
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From: drteddunne-at-yahoo.com
Date: Wed, 15 Nov 2006 09:12:35 -0600
Subject: [Microscopy] Philips 201 spares

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By some miracle does anyone have, or know of someone
who might have, a gun tilt for the Philips 201 TEM?

Thanks,

Ted Dunn
The EMscope Co. Ltd.
Thailand



____________________________________________________________________________________
Sponsored Link

Online degrees - find the right program to advance your career.
Www.nextag.com

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From: j.janssen-at-nki.nl
Date: Thu, 16 Nov 2006 07:48:46 -0600
Subject: [Microscopy] viaWWW: low contrast on uranyl staining of tokoyasu sections

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Hi

I do not know how FEI tell you to align the lenses but set out below are
generic lens alignment procedures - after all FEI produce a TEM so TEM
procedures should work!

1. Switch between the two magnifications that are proving to be a
problem.
2. Check the lens currents to find which lenses are activated during this
change
3 If an intermediate lens look at alignment A if a projector lens look at
alignment B.

A

A1 When switching the diffraction spot will flash on the screen.
A2 Adjust the intermediate lens such that when switching in either
direction the diffraction spot appears in exactly the same area, this may
not be on the centre of the screen.
A3 Adjust the lens above the problem lens to centre this diffraction spot
on the screen.
A4 Re check from A2.

B

B1 At the lower magnification align the first projector lens image centre
on the centre of the screen.
B2 Switch to the higher magnification and centre the second projector
image centre on the centre of the screen.
B3 Repeat until centres are exactly the same.

Hope this helps?

Steve Chapman
Senior Consultant Protrain
For electron microscopy consultancy and training world wide
Tel +44 1280 816512 Fax +44 1280 814007
Mobile +44 7711 606967 Web www.emcourses.com


----- Original Message -----
X-from: {nizets2-at-yahoo.com}
To: {protrain-at-emcourses.com}
Sent: Wednesday, November 15, 2006 2:54 PM

Hi,

If you mean "mechanical" adjustments of the lenses: you can't do this on
a Tecnai.

Are you sure this shift wasn't always happening?

Regards,
Sander

-----Original Message-----
X-from: protrain-at-emcourses.com [mailto:protrain-at-emcourses.com]
Sent: Wednesday, November 15, 2006 7:27 PM
To: Stoks, Sander

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Email: j.janssen-at-nki.nl
Name: Hans Janssen

Organization: Netherlands Cancer Institute

Title-Subject: [Filtered] low contrast on uranyl staining of tokoyasu sections

Question: For some time now we have problems with low contrast on our tokoyasu sections for immunoEM. After immune incubation we stain for 5 minutes with uranyloxalate pH 7, wash in H2O, followed by 0.6% uranylacetate in methylcellulose. This used to give a great contrast, but now membranes are hardly visible anymore. We tried solving this by using different brands and batches and higher percentages, but so far it did not get better. Maybe I open up an old discussion, but I am new to the listserver, so sorry in that case. Hope somebody can give some new insights.

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From: pocohe-at-yahoo.com
Date: Thu, 16 Nov 2006 07:49:21 -0600
Subject: [Microscopy] viaWWW: instruction for off-axis electron holography

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Email: pocohe-at-yahoo.com
Name: Yong He

Organization:

Title-Subject: [Filtered] instruction for off-axis electron holography

Question: Dear lister,
I am trying to research some magnetic materials by off-axis electron holography, but I am a new hand for using electron holography and still want to try it step by step if I can get one manual for electron holography. I will appreciate you if you can send me one copy by email.

Yong He

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From: wa5ekh-at-juno.com
Date: Thu, 16 Nov 2006 07:50:25 -0600
Subject: [Microscopy] viaWWW: Surplus Electroscan E3 ESEM

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Email: wa5ekh-at-juno.com
Name: charles Jeffrey Day

Organization: x

Title-Subject: [Filtered] Surplus Electroscan E3 ESEM

Question:
The company I work for in N. Texas has a surplus E3 Electroscan ESEM, 19=
89. When they have decided to replace it with a new instrument, they qui=
t repairing this instrument. The ESEM probably has a vacuum guage board =
that needs repair and the EDS(Tracor Noran Voyager,Be Window, 1989) also=
has a board issue. =

ALSO...I'll tell you working with water(vapor) detection at 1-20 torr ha=
s been a complete surprise, or revelation!, to an older EM operator (mys=
elf), who was for years been indoctrinated in "High Vac/High Voltage/LOW=
Water Vapor,Low Hydrocarbon" EM technology. There is a great deal more =
to this "Environmental EM" than I believe we realize. Not just the abili=
ty to image uncoated samples! For instance "STEEM" (my favorite personal=
term for Transmission ESEM) techniques for Ultrathin Cross Section imag=
ing at 20 KV is very interesting example! Have you seen?? ....images fro=
m HRETEM? I'd like to hear more from this community.
You can contact me at 817-792-1434 (direct or voice mail).
Jeff Day
wa5ekh-at-juno.com
(Charles Jeffrey Day)
(note: I receive no personal profit from this.)



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From: martini-at-accurel.com
Date: Thu, 16 Nov 2006 07:51:04 -0600
Subject: [Microscopy] viaWWW: Entry to Mid Level Dual Beam Operator

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Email: martini-at-accurel.com
Name: Martin Izquierdo

Organization: Accurel

Title-Subject: [Filtered] Entry to Mid Level Dual Beam Operator

Question: Accurel Systems located in Sunnyvale, CA is currently looking for an entry to mid level Dual Beam operator.

TEM experience a plus.

Please send resumes to
Helenl-at-accurel.com

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From: DES-at-CDC.GOV
Date: Thu, 16 Nov 2006 08:25:16 -0600
Subject: [Microscopy] viaWWW: MSDS Silver tetraphenylporphin

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Email: DES-at-CDC.GOV
Name: Diane Schwegler-Berry

Organization: NIOSH/CDC

Title-Subject: [Filtered] MSDS

Question: I have an old container of Silver tetraphenylporphin sulfanate and wish to dispose of it. I am looking for a MSDS for this chemical. Does anyone have a copy?
Thank you.

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From: smythen-at-musc.edu
Date: Thu, 16 Nov 2006 08:25:52 -0600
Subject: [Microscopy] viaWWW: Uranyl Acetate staining

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